公开(公告)号：US3133620A

公开(公告)日：1964-05-19

申请号：US15441461

申请日：1961-11-24

Applicant: IBM

Inventor： OKCNOGLU SELAHATTIN A ,  WALKER GEORGE A

IPC: B41J1/60

CPC classification number: B41J1/60 ,  Y10T74/206

公开(公告)号：US2902132A

公开(公告)日：1959-09-01

申请号：US55651455

申请日：1955-12-30

Applicant: IBM

Inventor： WALKER GEORGE A

IPC: B41J1/60

CPC classification number: B41J1/60

公开(公告)号：US2989166A

公开(公告)日：1961-06-20

申请号：US2615160

申请日：1960-05-02

Applicant: IBM

Inventor： WALKER GEORGE A ,  DODGE RONALD D ,  PALMER LEON E

IPC: B41J1/60

CPC classification number: B41J1/60

公开(公告)号：US3547245A

公开(公告)日：1970-12-15

申请号：US3547245D

申请日：1968-01-09

Applicant: IBM

Inventor： OKCUOGLU SELAHATTIN A ,  WALKER GEORGE A

IPC: B41J29/50 ,  B41J21/02

CPC classification number: B41J29/50

公开(公告)号：US3212610A

公开(公告)日：1965-10-19

申请号：US31213563

申请日：1963-09-27

Applicant: IBM

Inventor： WALKER GEORGE A ,  HOSEY RICHARD E

IPC: F16D11/06 ,  F16D11/16

CPC classification number: F16D11/16 ,  F16D11/06

公开(公告)号：CA757901A

公开(公告)日：1967-05-02

申请号：CA757901D

Applicant: IBM

Inventor： HOSEY RICHARD E ,  WALKER GEORGE A

公开(公告)号：CA886140A

公开(公告)日：1971-11-16

申请号：CA886140D

Applicant: IBM

Inventor： WALKER GEORGE A ,  OKCUOGLU SELAHATTIN A

公开(公告)号：CA1196112A

公开(公告)日：1985-10-29

申请号：CA438412

申请日：1983-10-05

Applicant: IBM

Inventor： WALKER GEORGE A

IPC: H01L21/027 ,  G03F1/00 ,  G03F7/20 ,  G03F7/26 ,  H01L21/30 ,  H05K3/24 ,  H01L21/02

Abstract: SELF-ALIGNING MASK A process for forming a self aligned resist mask over a surface of an alumina ceramic substrate having a conductive molybdenum pattern at said surface by first blanket coating the surface with a negative resist sensitive to aluminum emitting X-rays. A blanket dosing of the substrate with resist insensitive X-rays occurs to induce X-ray emission by the aluminum of said substrate to penetrate said resist. The aluminum X-ray emission is screened by said molybdenum pattern at the surface and the resist adjacent the surface molybdenum pattern is penetrated by the aluminum X-ray emission. The resist is developed for removal thereof over the molybdenum pattern while retaining the resist doped by said aluminum X-ray emission. Further metalization can be accomplished by evaporation or sputtering to blanket coat the developed resist with a conductive metal followed by removal of the resist with the metal coating thereon such that the metal coating is retained on the molybdenum pattern.

公开(公告)号：CA674948A

公开(公告)日：1963-11-26

申请号：CA674948D

Applicant: IBM

Inventor： WALKER GEORGE A ,  PALMER LEON E ,  DODGE RONALD D

公开(公告)号：CA700489A

公开(公告)日：1964-12-22

申请号：CA700489D

Applicant: IBM

Inventor： WALKER GEORGE A ,  OKCUOGLU SELAHATTIN A