公开(公告)号：DE2527908B1

公开(公告)日：1976-05-06

申请号：DE2527908

申请日：1975-06-23

Applicant: IBM DEUTSCHLAND

Inventor： FROSCH ALBERT ,  MANNSDOERFER WALTER ,  SCHEUING CLAUS

IPC: G01B11/14

公开(公告)号：DE3068214D1

公开(公告)日：1984-07-19

申请号：DE3068214

申请日：1980-09-06

Applicant: IBM DEUTSCHLAND ,  IBM

Inventor： FROSCH ALBERT ,  HINKEL HOLGER DR ,  KRAUS GEORG ,  KUNZEL ULRICH DR ,  ROGALLA DIETRICH DR ,  SCHNEIDER JOCHEN

IPC: B32B5/28 ,  B32B5/22 ,  B32B33/00 ,  G11B5/62 ,  G11B5/73 ,  G11B5/733 ,  G11B5/82 ,  G11B5/70 ,  H01F10/28

Abstract: 1. A magnetic disk substrate comprising a laminate of thin plastic lamellae (L1, L2, ..., LK), characterized in that said lamellae are reinforced by fibers (2) aligned in parallel to each other, that said anisotropic lamellae are arranged on top of each other at angular distances that are as large as possible, ranging from 0 to 60 degrees, and that the density of the outer lamellae is lower than that of the inner lamellae.

公开(公告)号：DE2140408A1

公开(公告)日：1973-03-01

申请号：DE2140408

申请日：1971-08-12

Applicant: IBM DEUTSCHLAND

Inventor： SCHMACKPFEFFER ARNO DR ,  FROSCH ALBERT ,  JAERISCH WALTER DR ,  ZILLER JOERG

IPC: G03H1/04 ,  G03H1/00 ,  G02B27/00

Abstract: A method is described for making holograms by means of linearly polarized object and reference beams, the reference beam being reflected inside the photosensitive emulsion. The plane of polarization of a linearly polarized reference beam includes an angle of 45 DEG with its plane of incidence. The beam is reflected under the critical angle of total internal reflection at the lower face of a photographic emulsion. The reflected beam is linearly polarized, too, its plane of polarization being turned by 90 DEG , so that no interference between these two beams is possible. An object beam passes a mask and is linearly polarized vertically either to the reference beam or to the reflected beam so that only one hologram can be formed and no undesired interaction between two holograms is possible when the mask is reproduced for exposure of a photoresist-covered semiconductor wafer.