公开(公告)号：DE2830589A1

公开(公告)日：1980-01-31

申请号：DE2830589

申请日：1978-07-12

Applicant: IBM DEUTSCHLAND

Inventor： STOEHR ROLAND ,  OBMANN ROBERT

IPC: C30B31/10 ,  C30B31/16 ,  C30B33/00 ,  H01L21/20

Abstract: The furnace has a reaction tube wish several reaction zones behind each other, each with different gas atmos. The mixing of the reaction gases is prevented by partitions reaching down from the furnace top almost to the semiconductor chips. An exhaust system provides the gas circulation. The transport system for the chips (10) is formed by a row of longitudinal beams (7, 8) with loading and unloading devices. Some beams (8) are stationary and have their surface horizontal in a given plane. Other beams (7) are movable by a drive system (11, 14) in the direction of tube axis and orthogonally to the plane of the stationary beam surfaces. During each closed movement loop the moving beams are twice at the same height with the stationary ones in an alternating arrangement.