公开(公告)号：DE2855723A1

公开(公告)日：1980-07-10

申请号：DE2855723

申请日：1978-12-22

Applicant: IBM DEUTSCHLAND

Inventor： MORITZ HOLGER ,  SCHACKERT KLAUS DIPL PHYS

IPC: G03F7/022 ,  G03F7/10

Abstract: Crosslinking agent used in positive resist is an N-(N'-2-hydroxyethyl)-aminoethyl-amide cpd. (I) of formula R-CO-NH-CH2CH2-NH(CH2)2OH (in which R is alkyl). Positive resist is used to make negative of a mask by exposing a sealed layer of the resist contg. (I) through the mask; heating for a fixed time to a fixed temp., then giving a blanket exposure before final development. Process is specified for use in prodn. of lift-off masks, esp. for use in metallisation. It is relatively simple, and suitable for large scale operation. Good resolution is obtd. and the negative is very true to the original, with very small tolerances and very few flaws. (I), which is the hydrolysis prod. of 1-hydroxyethyl-2-alkylimidazoline (II), gives better results than (II) itself and also promotes adhesion of the resist to the substrate.