公开(公告)号：JP2008012658A

公开(公告)日：2008-01-24

申请号：JP2007158187

申请日：2007-06-15

Applicant: Imra America Inc ,  イムラ アメリカ インコーポレイテッド

Inventor： BIN RIU ,  ZHENDONG HU ,  YONG CHE

IPC: B82B3/00 ,  C01B13/14 ,  C01G51/04 ,  C01G53/04 ,  C23C14/28 ,  H01S3/00

CPC classification number: C23C14/28 ,  B22F9/12 ,  B22F2998/00 ,  B22F2999/00 ,  C01G53/04 ,  C01P2004/04 ,  C01P2004/51 ,  B22F1/0018 ,  B22F2202/11

Abstract: PROBLEM TO BE SOLVED: To provide a one-step process for producing and depositing size-selected nanoparticles onto a substrate surface using ultrafast pulsed laser ablation of solid target materials.
SOLUTION: This system includes a pulse laser, an optical system, and a vacuum chamber. The pulsed laser has various pulse duration ranging from a few femtoseconds to a few tens of picoseconds. The optical system processes a laser beam such that the beam is focused onto the target surface with an appropriate average energy density and an appropriate energy density distribution. The target and the substrate are installed inside the vacuum chamber, and the background gases and their pressures are appropriately adjusted.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供用于使用固体靶材料的超快脉冲激光烧蚀来在尺寸选定的纳米颗粒上生产并沉积到衬底表面上的一步法。

解决方案：该系统包括脉冲激光器，光学系统和真空室。 脉冲激光器具有从几飞秒到几十皮秒的各种脉冲持续时间。 光学系统处理激光束，使得光束以适当的平均能量密度和适当的能量密度分布聚焦到目标表面上。 目标和基板安装在真空室内，背景气体及其压力被适当地调节。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011006793A

公开(公告)日：2011-01-13

申请号：JP2010167263

申请日：2010-07-26

Applicant: Imra America Inc ,  イムラ アメリカ インコーポレイテッド

Inventor： BIN RIU ,  ZHENDONG HU ,  YONG CHE ,  YUZURU UEHARA

IPC: C23C14/04 ,  C23C14/08 ,  H01L21/363

CPC classification number: C23C14/22 ,  C23C14/083 ,  C23C14/28

Abstract: PROBLEM TO BE SOLVED: To provide a method for depositing a transparent thin film and directly depositing a pattern structure.SOLUTION: In the method where a transparent thin film is deposited, and a pattern structure is directly deposited, a pulse laser source is provided, a laser 1 emitted by the pulse laser source is condensed on a target 5 via a transparent substrate 3, the part of the target is melted away or evaporated using the energy of the laser, the substrate is translated to the target, the material of the target melted away or evaporated is deposited on the substrate, and a pattern structure can be formed on the substrate.

Abstract translation: 要解决的问题：提供一种沉积透明薄膜并直接沉积图案结构的方法。解决方案：在沉积透明薄膜并直接沉积图案结构的方法中，提供脉冲激光源， 由脉冲激光源发射的激光器1通过透明基板3在目标5上冷凝，使用激光的能量使目标物的一部分熔化或蒸发，将基板平移到目标物 目标熔化或蒸发沉积在基板上，并且可以在基板上形成图案结构。

公开(公告)号：JP2014040666A

公开(公告)日：2014-03-06

申请号：JP2013177698

申请日：2013-08-29

Applicant: Imra America Inc ,  イムラ アメリカ インコーポレイテッド

Inventor： BIN RIU ,  ZHENDONG HU ,  YONG CHE ,  YUZURU UEHARA

IPC: C23C14/08 ,  H01L21/363

CPC classification number: C23C14/22 ,  C23C14/083 ,  C23C14/28

Abstract: PROBLEM TO BE SOLVED: To disclose a p-type semiconductor zinc oxide (ZnO) film, and a method of manufacturing the film.SOLUTION: The film is simultaneously added with phosphorus (P) and lithium (Li). A light path of a pulse laser is arranged so that the pulse laser comes in a substrate from the rear side of the substrate, passes through the substrate and condenses on a target. The substrate is subject to translation movement toward the target, and this arrangement enables deposition of a fine pattern using an ablation plume route. The ablation plume route is present in a one-dimensional transition stage along a normal vector of the target before an angle width of the plume expands in three-dimensional adiabatic expansion. A fine film deposition pattern having a size similar to a laser condensation spot is thus obtained, and a new method of direct film deposition on a patterned material is obtained.

Abstract translation: 要解决的问题：公开一种p型半导体氧化锌（ZnO）膜及其制造方法。溶液：同时添加磷（P）和锂（Li）。 布置脉冲激光器的光路，使得脉冲激光从基板的后侧进入基板，通过基板并在目标上冷凝。 基板经历朝向目标的平移运动，并且这种布置使得能够使用消融羽流路线沉积精细图案。 在羽流的角度宽度在三维绝热膨胀之前，消融羽流路线沿着目标的法向矢量存在于一维过渡阶段中。 因此获得具有与激光凝聚点相似的尺寸的精细的膜沉积图案，并且获得了在图案化材料上直接成膜的新方法。

公开(公告)号：JP2007288141A

公开(公告)日：2007-11-01

申请号：JP2007024358

申请日：2007-02-02

Applicant: Imra America Inc ,  イムラ アメリカ インコーポレイテッド

Inventor： BIN RIU ,  ZHENDONG HU ,  YONG CHE ,  YUZURU UEHARA

IPC: H01L21/363 ,  C23C14/28 ,  G02B1/10 ,  H01S3/00

CPC classification number: C23C14/22 ,  C23C14/083 ,  C23C14/28

Abstract: PROBLEM TO BE SOLVED: To provide a p-type semiconductor zinc oxide (ZnO) film and a manufacturing method of this film. SOLUTION: A p-type ZnO material is deposited by using a pulsed laser deposition method (PLD). In this method, a pulsed laser beam is focused on a solid target comprising a mixture of a compound containing both Li and P with ZnO. By the high power density of the focused laser pulse, the material on the target surface is ablated. Then, plasma is formed, and this is deposited on the surface of the substrate. Moreover, there is described a pulsed laser deposition process using a transparent substrate including a pulsed laser source, a substrate that is transparent to the wavelength of the pulsed laser, and a multi-target system. The optical path of the pulsed laser is arranged in such a manner that the pulsed laser is incident from the back of the substrate to pass through the substrate and is focused on the target. By translating the substrate toward the target, the attachment of a micro pattern using the root of an ablation plume is permitted. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 待解决的问题：提供一种p型半导体氧化锌（ZnO）膜及其制造方法。 解决方案：使用脉冲激光沉积法（PLD）沉积p型ZnO材料。 在该方法中，将脉冲激光束聚焦在包含Li和P两者的化合物与ZnO的混合物的固体靶上。 通过聚焦激光脉冲的高功率密度，目标表面上的材料被烧蚀。 然后，形成等离子体，并将其沉积在基板的表面上。 此外，描述了使用包括脉冲激光源，对于脉冲激光的波长透明的衬底的多透射衬底和多目标系统的脉冲激光沉积工艺。 脉冲激光器的光路布置成使得脉冲激光从衬底的背面入射以通过衬底并聚焦在靶上。 通过将衬底平移到靶，允许使用消融羽的根部附着微图形。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：US20140093744A1

公开(公告)日：2014-04-03

申请号：US14097633

申请日：2013-12-05

Applicant: IMRA AMERICA, INC.

Inventor： ZHENDONG HU ,  Yong Che ,  Bing Liu

IPC: C30B23/08 ,  C30B29/16 ,  C23C14/28

CPC classification number: C30B23/08 ,  C23C14/083 ,  C23C14/28 ,  C30B29/16

Abstract: A one-step and room-temperature process for depositing nanoparticles or nanocomposite (nanoparticle-assembled) films of metal oxides such as crystalline titanium dioxide (TiO2) onto a substrate surface using ultrafast pulsed laser ablation of Titania or metal titanium target. The system includes a pulsed laser with a pulse duration ranging from a few femtoseconds to a few tens of picoseconds, an optical setup for processing the laser beam such that the beam is focused onto the target surface with an appropriate average energy density and an appropriate energy density distribution, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.

Abstract translation: 使用二氧化钛或金属钛靶的超快速脉冲激光烧蚀将金属氧化物如结晶二氧化钛（TiO 2）的纳米颗粒或纳米复合材料（纳米颗粒组装的）膜沉积到基底表面上的一步和室温方法。 该系统包括脉冲激光，其脉冲持续时间范围从几飞秒到几十皮秒，用于处理激光束的光学设置，使得光束以适当的平均能量密度和适当的能量聚焦到目标表面上 密度分布，以及真空室，其中安装了目标物和基质，背景气体及其压力被适当调节。