P-TYPE SEMICONDUCTOR ZINC OXIDE FILMS PROCESS FOR PREPARATION THEREOF, AND PULSED LASER DEPOSITION METHOD USING TRANSPARENT SUBSTRATES
    2.
    发明申请
    P-TYPE SEMICONDUCTOR ZINC OXIDE FILMS PROCESS FOR PREPARATION THEREOF, AND PULSED LASER DEPOSITION METHOD USING TRANSPARENT SUBSTRATES 审中-公开
    P型半导体氧化锌膜及其制备方法,以及使用透明基板的脉冲激光沉积方法

    公开(公告)号:US20140017416A1

    公开(公告)日:2014-01-16

    申请号:US14025418

    申请日:2013-09-12

    CPC classification number: C23C14/22 C23C14/083 C23C14/28

    Abstract: A p-type semiconductor zinc oxide (ZnO) film and a process for preparing the film are disclosed. The film is co-doped with phosphorous (P) and lithium (Li). A pulsed laser deposition scheme is described for use in growing the film. Further described is a process of pulsed laser deposition using transparent substrates which includes a pulsed laser source, a substrate that is transparent at the wavelength of the pulsed laser, and a multi-target system. The optical path of the pulsed laser is arranged in such a way that the pulsed laser is incident from the back of the substrate, passes through the substrate, and then focuses on the target. By translating the substrate towards the target, this geometric arrangement enables deposition of small features utilizing the root of the ablation plume, which can exist in a one-dimensional transition stage along the target surface normal, before the angular width of the plume is broadened by three-dimensional adiabatic expansion. This can provide small deposition feature sizes, which can be similar in size to the laser focal spot, and provides a novel method for direct deposition of patterned materials.

    Abstract translation: 公开了一种p型半导体氧化锌(ZnO)膜及其制备方法。 该膜与磷(P)和锂(Li)共掺杂。 描述脉冲激光沉积方案用于生长膜。 进一步描述的是使用透明衬底的脉冲激光沉积过程,其包括脉冲激光源,在脉冲激光的波长处是透明的衬底和多目标系统。 脉冲激光器的光路布置成使得脉冲激光从衬底的背面入射,穿过衬底,然后聚焦在靶上。 通过将基板朝向目标平移,这种几何布置可以在羽流的角宽度扩大之前利用消融羽流的根部沉积小特征,其可以沿着目标表面法线存在于一维过渡阶段中 三维绝热膨胀。 这可以提供小的沉积特征尺寸,其尺寸可以与激光焦点类似,并且提供用于直接沉积图案化材料的新颖方法。

    PULSED LASER MICRO-DEPOSITION PATTERN FORMATION
    4.
    发明申请
    PULSED LASER MICRO-DEPOSITION PATTERN FORMATION 审中-公开
    脉冲激光微沉积图形成

    公开(公告)号:US20140161998A1

    公开(公告)日:2014-06-12

    申请号:US14178414

    申请日:2014-02-12

    Abstract: A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.

    Abstract translation: 公开了使用脉冲激光在透明基板上形成图案的方法。 各种实施例包括超短脉冲激光器,对激光波长透明的衬底和靶板。 激光束被引导通过透明基板并聚焦在目标表面上。 目标材料被激光烧蚀并沉积在相对的基板表面上。 通过相对于目标扫描激光束来形成例如灰度图像的图案。 激光束扫描速度和扫描线密度的变化控制材料沉积并改变沉积图案的光学性质,产生灰度的视觉效果。 在一些实施例中,可以在制造过程期间在微电子器件的一部分上形成图案。 在一些实施例中,高重复率皮秒和纳秒源被配置为产生图案。

Patent Agency Ranking