公开(公告)号：AU2003296748A8

公开(公告)日：2004-08-10

申请号：AU2003296748

申请日：2003-12-31

Applicant: INFINEON TECHNOLOGIES AG

Inventor： BARTH HANS-JOACHIM ,  HOLZ JURGEN

IPC: H01L23/522 ,  H01L23/532 ,  H01L21/02 ,  H01L21/308 ,  H01L21/768

Abstract: A method for production of an integrated circuit arrangement which contains a capacitor. A dielectric layer is structured with the aid of a two-stage etching process, and with the aid of a hard mask. In the case of an electrically insulating hard mask, the hard mask is removed again. In the case of an electrically conductive hard mask, parts of the hard mask may remain in the circuit arrangement.

公开(公告)号：AU2003296748A1

公开(公告)日：2004-08-10

申请号：AU2003296748

申请日：2003-12-31

Applicant: INFINEON TECHNOLOGIES AG

Inventor： BARTH HANS-JOACHIM ,  HOLZ JURGEN

IPC: H01L23/522 ,  H01L23/532 ,  H01L27/08

Abstract: A method for production of an integrated circuit arrangement which contains a capacitor. A dielectric layer is structured with the aid of a two-stage etching process, and with the aid of a hard mask. In the case of an electrically insulating hard mask, the hard mask is removed again. In the case of an electrically conductive hard mask, parts of the hard mask may remain in the circuit arrangement.