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公开(公告)号:DE102004040796A1
公开(公告)日:2005-10-20
申请号:DE102004040796
申请日:2004-08-23
Applicant: INFINEON TECHNOLOGIES AG
Inventor: GUTSCHE MARTIN ULRICH , SEIDL HARALD , REHLAENDER ROLAND
IPC: H01L21/02 , H01L21/8239 , H01L27/08 , H01L27/105
Abstract: Micro-electronic capacitor structure (100) comprises a primary conducting layer (101), a dielectric layer (102) and a second conducting layer (103). The dielectric layer consists of a lanthanide or actinide metal oxide.