Semiconductor device and method of forming a semiconductor device

    公开(公告)号:US11217529B2

    公开(公告)日:2022-01-04

    申请号:US16592156

    申请日:2019-10-03

    Abstract: A semiconductor device and method is disclosed. The semiconductor device may include a semiconductor substrate including an active area, a metal layer structure over the active area, wherein the metal layer structure is configured to form an electrical contact, the metal layer structure including a solder area, a buffer area, and a barrier area between the solder area and the buffer area, wherein, in the barrier area, the metal layer structure is further away from the active area than in the solder area and in the buffer area, and wherein each of the solder area and the buffer area is in direct contact with the active area or with a wiring layer structure arranged between the active area and the metal layer structure.

    Microfluidic device and method
    4.
    发明授权

    公开(公告)号:US10086370B2

    公开(公告)日:2018-10-02

    申请号:US13763404

    申请日:2013-02-08

    Abstract: A microfluidic device includes a semiconductor chip having a main chip surface. The microfluidic device further includes an encapsulation body embedding the semiconductor chip, the encapsulation body having a main body surface. A microfluidic component extends over the main chip surface and over the main encapsulation body surface and traverses an outline of the main chip surface.

Patent Agency Ranking