公开(公告)号：US20140177039A1

公开(公告)日：2014-06-26

申请号：US14144222

申请日：2013-12-30

Applicant: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES

Inventor： Hailiang Li ,  Changqing Xie ,  Ming Liu ,  Dongmei Li ,  Lina Shi ,  Xiaoli Zhu

IPC: G02B5/18

CPC classification number: G02B5/1871 ,  G02B5/1809 ,  G02B5/1838 ,  G02B5/1857 ,  G02B2005/1804 ,  G03F7/0757 ,  G03F7/2059 ,  G03F7/40

Abstract: A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition. Lastly, removing the gold material on the chrome material outside the ring pattern as well as on and between the grating line patterns, thereby only retaining the gold material on sidewalls of the grating line patterns.

Abstract translation: 公开了一种制造亚波长极紫外金属透射光栅的方法。 在一个方面，该方法包括在硅衬底的背表面上形成氮化硅自支撑膜窗，其两面被抛光，然后用电子束在衬底的前表面上旋涂氮化硅膜 抵制HSQ。 然后，在HSQ上执行电子束直接写入曝光，显影和固定以形成围绕光栅线图案的多个光栅线图案和环形图案。 然后通过磁控溅射在基板的前表面上沉积铬材料。 然后，移除环形图案内的铬材料。 然后，通过原子层沉积在基板的前表面上生长金材料。 最后，除去环形图案之外的铬材料上的金材料以及光栅线图案之间和之间的金材料，从而仅将金材料保留在光栅线图案的侧壁上。

公开(公告)号：US09442230B2

公开(公告)日：2016-09-13

申请号：US14144222

申请日：2013-12-30

Applicant: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES

Inventor： Hailiang Li ,  Changqing Xie ,  Ming Liu ,  Dongmei Li ,  Lina Shi ,  Xiaoli Zhu

IPC: G06K7/10 ,  G02B5/18 ,  G03F7/075 ,  G03F7/20 ,  G03F7/40

CPC classification number: G02B5/1871 ,  G02B5/1809 ,  G02B5/1838 ,  G02B5/1857 ,  G02B2005/1804 ,  G03F7/0757 ,  G03F7/2059 ,  G03F7/40

Abstract: A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition. Lastly, removing the gold material on the chrome material outside the ring pattern as well as on and between the grating line patterns, thereby only retaining the gold material on sidewalls of the grating line patterns.

Abstract translation: 公开了一种制造亚波长极紫外金属透射光栅的方法。 在一个方面，该方法包括在硅衬底的背表面上形成氮化硅自支撑膜窗，其两面被抛光，然后用电子束在衬底的前表面上旋涂氮化硅膜 抵制HSQ。 然后，在HSQ上执行电子束直接写入曝光，显影和固定以形成围绕光栅线图案的多个光栅线图案和环形图案。 然后通过磁控溅射在基板的前表面上沉积铬材料。 然后，移除环形图案内的铬材料。 然后，通过原子层沉积在基板的前表面上生长金材料。 最后，除去环形图案之外的铬材料上的金材料以及光栅线图案之间和之间的金材料，从而仅将金材料保留在光栅线图案的侧壁上。