公开(公告)号：US20220317338A1

公开(公告)日：2022-10-06

申请号：US17310206

申请日：2019-02-01

Applicant: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES

Inventor： Lina SHI ,  Longjie LI ,  Kaiping ZHANG ,  Jiebin NIU ,  Changqing XIE ,  Ming LIU

IPC: G02B1/12 ,  G02B1/02 ,  G02B1/118 ,  G03F7/20

Abstract: The present disclosure provides a method for fabricating an anti-reflective layer on a quartz surface by using a metal-induced self-masking etching technique, comprising: performing reactive ion etching to a metal material and a quartz substrate by using a mixed gas containing a fluorine-based gas, wherein metal atoms and/or ions of the metal material are sputtered to a surface of the quartz substrate, to form a non-volatile metal fluoride on the surface of the quartz substrate; forming a micromask by a product of etching generated by reactive ion etching gathering around the non-volatile metal fluoride; and etching the micromask and the quartz substrate simultaneously, to form an anti-reflective layer having a sub-wavelength structure.