MEMORY
    1.
    发明申请
    MEMORY 有权

    公开(公告)号:US20220122997A1

    公开(公告)日:2022-04-21

    申请号:US17310282

    申请日:2019-01-28

    Abstract: Disclosed is a memory, including a plurality of memory units, wherein each memory unit includes: a bulk substrate; a source electrode, a drain electrode and a channel region extending between a source region and a drain region that are located on the bulk substrate; a deep-level defect dielectric layer on the channel region; and a gate electrode on the deep-level defect dielectric layer. The memory of the present disclosure allows the memory unit to operate in the charge trapping mode and the polarization inversion mode. Therefore, the memory has functions of both DRAM and NAND, and combines the advantages of the two.

    WRITING METHOD AND ERASING METHOD OF FUSION MEMORY

    公开(公告)号:US20220115052A1

    公开(公告)日:2022-04-14

    申请号:US17426053

    申请日:2019-01-28

    Abstract: A writing method and erasing method of a fusion memory are provided, and the fusion memory includes a plurality of memory cells, and each memory cell of the plurality of memory cells includes a bulk substrate; a source and a drain on the bulk substrate, a channel region extending between the source and the drain, and a ferroelectric layer and a gate stacked on the channel region; and the writing method includes: applying a first voltage between the gate of at least one memory cell and the bulk of at least one memory cell, in which the first voltage is less than a reversal voltage at which the ferroelectric layer is polarization reversed, and each of the source and the drain is grounded or in a floating state.

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