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公开(公告)号:US12002500B2
公开(公告)日:2024-06-04
申请号:US17426053
申请日:2019-01-28
Inventor: Hangbing Lv , Qing Luo , Xiaoxin Xu , Tiancheng Gong , Ming Liu
CPC classification number: G11C11/2273 , G11C11/2275 , G11C11/2297 , G11C16/14 , G11C16/3404
Abstract: A writing method and erasing method of a fusion memory are provided, and the fusion memory includes a plurality of memory cells, and each memory cell of the plurality of memory cells includes a bulk substrate; a source and a drain on the bulk substrate, a channel region extending between the source and the drain, and a ferroelectric layer and a gate stacked on the channel region; and the writing method includes: applying a first voltage between the gate of at least one memory cell and the bulk of at least one memory cell, in which the first voltage is less than a reversal voltage at which the ferroelectric layer is polarization reversed, and each of the source and the drain is grounded or in a floating state.
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公开(公告)号:US20220093150A1
公开(公告)日:2022-03-24
申请号:US17424998
申请日:2019-01-28
Inventor: Hangbing Lv , Qing Luo , Xiaoxin Xu , Tiancheng Gong , Ming Liu
IPC: G11C11/22 , H01L27/1159 , H01L27/11597 , H01L29/51 , H01L29/78 , G06N3/063
Abstract: The present disclosure provides a fusion memory including a plurality of memory cells, wherein each memory cell of the plurality of memory cells includes: a bulk substrate; a source and a drain on the bulk substrate; a channel extending between the source and the drain; a ferroelectric layer on the channel; and a gate on the ferroelectric layer.
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公开(公告)号:US11776607B2
公开(公告)日:2023-10-03
申请号:US17424998
申请日:2019-01-28
Inventor: Hangbing Lv , Qing Luo , Xiaoxin Xu , Tiancheng Gong , Ming Liu
CPC classification number: G11C11/223 , G06N3/063 , H01L29/516 , H01L29/78391 , H10B51/20 , H10B51/30
Abstract: The present disclosure provides a fusion memory including a plurality of memory cells, wherein each memory cell of the plurality of memory cells includes: a bulk substrate; a source and a drain on the bulk substrate; a channel extending between the source and the drain; a ferroelectric layer on the channel; and a gate on the ferroelectric layer.
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