公开(公告)号：EP2421875B1

公开(公告)日：2017-08-23

申请号：EP10767539.9

申请日：2010-04-15

Applicant: Invista Technologies S.à.r.l.

Inventor： RITTER, Joachim C. ,  VOS, Thomas E.

IPC: C07F9/145 ,  C07F9/6574 ,  C07F9/146

CPC classification number: C07F9/146 ,  C07F9/145 ,  C07F9/65746

公开(公告)号：EP2928598A1

公开(公告)日：2015-10-14

申请号：EP13812362.5

申请日：2013-12-06

Applicant: Invista Technologies S.à.r.l.

Inventor： VOS, Thomas E.

IPC: B01J31/18 ,  C07C253/10 ,  C07C53/10

CPC classification number: B01J31/185 ,  B01J37/00 ,  B01J2231/322 ,  B01J2531/847 ,  B01J2531/90 ,  C07C253/10 ,  C07C255/07 ,  C07C255/04

Abstract: In the hydrocyanation reaction of butadiene proceeding through pentenenitriles to adiponitrile, catalysis by complexes of zerovalent nickel with bidentate phosphorus-based ligands of the NiL
2 A type wherein L
2 is a bidentate ligand and A is an unsaturated compound, can be rate-limited by the solubility of the catalytic complex. The present invention concerns solvent compositions for the nickel-ligand complex comprising mixtures of unsaturated nitriles that provide for increased metal solubility, particularly in the absence of a Lewis acid promoter, resulting in higher hydrocyanation reaction rates in an industrial-scale process for production of important nylon manufacturing intermediates. The mixed nitrile solvent compositions can include mixtures of pentenenitriles and/or methylbutenenitriles. The mixtures of mixed unsaturated nitriles can be, at least in part, from recycle streams from the hydrocyanation reaction for which the nickel-bidentate ligand complexes are used as catalysts.

Abstract translation: 在通过戊烯腈进行己二腈的丁二烯的氢氰化反应中，通过零价镍的络合物与NiL2A型的二齿磷系配体的催化作用，其中L2是二齿配体，A是不饱和化合物，可以通过溶解度 催化复合物。 本发明涉及镍 - 配体络合物的溶剂组合物，其包含不饱和腈的混合物，其提供增加的金属溶解度，特别是在不存在路易斯酸促进剂的情况下，导致在工业规模生产过程中较高的氢氰化反应速率 尼龙制造中间体。 混合的腈溶剂组合物可以包括戊烯腈和/或甲基丁烯腈的混合物。 混合不饱和腈的混合物可以至少部分地来自使用镍二齿配位体配合物作为催化剂的氢化氰化反应的再循环流。

公开(公告)号：EP2794045B1

公开(公告)日：2016-12-21

申请号：EP12795269.5

申请日：2012-11-20

Applicant: Invista Technologies S.à.r.l.

Inventor： TENN, William, J. ,  AKI, Sudhir N.V.K. ,  CHAO, Tseng H. ,  VOS, Thomas E.

IPC: B01D11/04 ,  B01J31/18 ,  B01J31/26 ,  B01J38/56 ,  C07F9/02 ,  B01J31/40

CPC classification number: C07F9/145 ,  B01D11/0426 ,  B01D11/0457 ,  B01J31/185 ,  B01J31/26 ,  B01J31/4053 ,  C07F9/65746 ,  C07F15/04 ,  Y02P20/582