公开(公告)号：JP2009079049A

公开(公告)日：2009-04-16

申请号：JP2008247762

申请日：2008-09-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHIMURA YUKIO ,  O ISAMU

IPC: C07D333/46

Abstract: PROBLEM TO BE SOLVED: To provide an onium salt suitable for a radiation-sensitive acid generating agent, to provide a radiation-sensitive acid generating agent comprising the onium salt as an essential component, and to provide a positive-type radiation-sensitive resin composition containing the radiation-sensitive acid generating agent. SOLUTION: The onium salt is represented by formula (5) (wherein, Ar 3 is a divalent aromatic hydrocarbon or the like; R 5 and R 6 are an alkyl group or the like; w is an integer of 1-10; y is an integer of 0-6; and v is an integer of 0-3), the radiation-sensitive acid generating agent comprising the onium salt as an essential component is provided, and the positive-type radiation-sensitive resin composition comprises the acid generating agent. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供适合于辐射敏感性的酸产生剂的鎓盐，以提供包含鎓盐作为必需组分的辐射敏感性酸产生剂，并提供阳离子型辐射 - 含有辐射敏感性酸产生剂的敏感性树脂组合物。 解决方案：鎓盐由式（5）表示（其中，Ar 3为二价芳烃等; R 5为SP＆ 6是烷基等; w是1-10的整数; y是0-6的整数; v是0-3的整数），辐射敏感的酸产生剂包括 提供鎓盐作为必需组分，正型辐射敏感性树脂组合物包含酸产生剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007013071A

公开(公告)日：2007-01-18

申请号：JP2005335869

申请日：2005-11-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MIYAMATSU TAKASHI ,  O ISAMU ,  YADA YUJI ,  SHIMIZU DAISUKE

IPC: H01L21/027 ,  G03F7/004 ,  G03F7/039 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To solve the problem of such an adverse influence as the deterioration in resist shape due to dissolution of resist resin, the extraction of photoacid generation agent, basic additive or the like; to satisfy various requests as liquid for liquid immersion whose refractive index is higher than that of water, and whose transparency at 248 mm and recycle property are high; and to form a pattern which is excellent in sensitivity, resolution, focal depth, and shape in the case of using the liquid for liquid immersion as liquid for KrF liquid immersion. SOLUTION: This liquid is used for a liquid immersion exposure device or a liquid immersion exposure method for carrying out exposure through liquid filled between a projection optical system lens and a substrate. The liquid is configured as a multi-ring saturated hydrocarbon compound having at least two ring structures in molecules whose transparency per optical length 1 mm in 248 nm is 90% or more. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了解决由于抗蚀剂树脂的溶解导致的抗蚀剂形状的劣化，光致酸产生剂，碱性添加剂等的提取的不良影响的问题。 满足各种要求，其折射率高于水的液浸液体，其透明度为248mm，再循环性高; 并且在使用用于液浸的液体作为KrF液浸的液体的情况下形成灵敏度，分辨率，焦深和形状优异的图案。 解决方案：该液体用于液浸曝光装置或液浸曝光方法，用于通过在投影光学系统透镜和基板之间填充的液体进行曝光。 液体被配置为在分子中具有至少两个环结构的多环饱和烃化合物，其在248nm中每1mm光学长度的透明度为90％以上。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006173295A

公开(公告)日：2006-06-29

申请号：JP2004362445

申请日：2004-12-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HIEDA KATSUHIKO ,  MIYAMATSU TAKASHI ,  O ISAMU

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide an exposure means wherein oxygen is not dissolved in a liquid for immersion exposure, preventing the liquid for immersion exposure from absorbing light, and a liquid having a low flash point can be used safe, when the immersion method is used. SOLUTION: The immersion exposure apparatus 100 comprises a lighting means 211 for lighting an original plate 101, a substrate holding means 112 for holding a substrate 111, and a projection optical means 121 for transferring the pattern of the original plate 101 onto the substrate 111. A space between a top end part 123 of an optical element on the substrate 111 side of the projection optical means 121 and the surface of the substrate 111 is filled up with a liquid 301. The immersion exposure apparatus 100 includes a low oxygen concentration means for making the oxygen concentration at least around the liquid 301 lower than the air. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种曝光装置，其中氧气不溶于浸没液体的液体中，防止液体浸入曝光吸收光，并且可以安全地使用具有低闪点的液体，当 使用浸渍法。 解决方案：浸没曝光装置100包括用于照亮原版101的照明装置211，用于保持基板111的基板保持装置112和用于将原版101的图案转印到基板111上的投影光学装置121。 基板111.投影光学装置121的基板111侧的光学元件的顶端部123与基板111的表面之间的空间填充有液体301.浸渍曝光装置100包括低氧 浓度意味着使氧浓度至少在液体301的周围比空气低。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005314308A

公开(公告)日：2005-11-10

申请号：JP2004134782

申请日：2004-04-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAI TOMOKI ,  YADA YUJI ,  O ISAMU

IPC: G03F7/039 ,  C07C337/00 ,  C09K3/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new diazodisulfone compound having high sensitivity to far ultraviolet rays, particularly represented by KrF excimer laser or ArF excimer laser and capable of providing a chemical amplification type resist excellent in line edge roughness, tolerance, etc., of depth of focus, when used as a radiation sensitive acid generator and to provide a positive type radiation-sensitive resin composition containing the diazodisulfone compound as the radiation-sensitive acid generator. SOLUTION: The diazodisulfone compound is represented by formula (1) (wherein R 1 to R 9 are each a hydrogen atom, a 1-4C alkyl group, a 1-4C alkoxy group or a 1-4C hydroxyalkyl group; A is a substituted or unsubstituted 1-10C straight-chain or branched divalent hydrocarbon group). The radiation-sensitive resin composition comprises (A) the diazosulfone compound and (B) an acid-dissociative group-containing resin which becomes readily soluble in an alkali when an acid-dissociative group is dissociated. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供对远紫外线具有高灵敏度的新的重氮二砜化合物，特别是由KrF准分子激光或ArF准分子激光器表示，并且能够提供线边缘粗糙度，耐受性等优异的化学放大型抗蚀剂。 用作辐射敏感性酸产生剂，并提供含有重氮二砜化合物作为辐射敏感性酸产生剂的正型辐射敏感性树脂组合物。 解决方案：重氮二砜化合物由式（1）表示（其中R 1至S 1 各自为氢原子，1-4C烷基， 1-4C烷氧基或1-4C羟烷基; A是取代或未取代的1-10C直链或支链二价烃基）。 辐射敏感性树脂组合物包含（A）重氮砜化合物和（B）当酸解离基解离时易溶于碱的酸解离基团的树脂。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005206548A

公开(公告)日：2005-08-04

申请号：JP2004016352

申请日：2004-01-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MIYAMATSU TAKASHI ,  YONEDA EIJI ,  NISHIMURA YUKIO ,  O ISAMU

IPC: C07D307/93 ,  C07D307/33 ,  C08F24/00

Abstract: PROBLEM TO BE SOLVED: To provide a sparingly alkali-soluble resin-containing new polymer having a lactone ring substituted with an ether group, in which a carbon atom constituting the lactone ring forms a polymer main chain and a new unsaturated compound useful as a synthetic raw material, etc., for polymers.
SOLUTION: The unsaturated compound is represented by general formula (1) [wherein R
1 is a substituted or unsubstituted 1-14C monovalent non-aromatic hydrocarbon group and R
2 is a hydrogen atom or a 1-14C alkyl group and n is an integer of 1-3] and its polymer has a recurring unit represented by general formula (I) [wherein R
1 , R
2 and n are each as defined above].
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有由醚基取代的内酯环的微溶碱性树脂的新型聚合物，其中构成内酯环的碳原子形成聚合物主链和新的不饱和化合物有用 作为聚合物的合成原料等。 解决方案：不饱和化合物由通式（1）表示[其中R 1是取代或未取代的1-14C一价非芳族烃基，R SP SP 2 >是氢原子或1-14C烷基，n是1-3的整数]，其聚合物具有由通式（I）表示的重复单元[其中R 1， SP> 2 和n各自如上所定义]。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005126459A

公开(公告)日：2005-05-19

申请号：JP2003360290

申请日：2003-10-21

Applicant: Jsr Corp ,  Jsr株式会社 ,  Otsuka Chemical Co Ltd ,  大塚化学株式会社

Inventor： NISHIMURA ISAO ,  O ISAMU ,  KAMESHIMA TAKASHI

IPC: G03F7/033 ,  C07C395/00 ,  C08F4/00 ,  C08F20/10 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a (meth)acrylic polymer having a specified molecular weight distribution and a production method for synthesizing the polymer. SOLUTION: The (meth)acrylic polymer is produced by polymerizing (i) a compound represented by formula (1) or (ii) a mixture consisting of a compound represented by formula (1), a radical polymerization initiator, and at least one compound selected from among ditelluride compounds represented by formula (2). In formulas (1) and (2), R a is a 1-8C alkyl group, an optionally substituted aryl group, or an aromatic heterocyclic group; R b and R c are each H or a 1-8C alkyl group; and R d is an optionally substituted aryl group, an aromatic heterocyclic group, or an acyl, oxycarbonyl, or cyano group. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 待解决的问题：提供具有特定分子量分布的（甲基）丙烯酸类聚合物和合成聚合物的制备方法。 （甲基）丙烯酸类聚合物通过以下方法制备：（i）由式（1）表示的化合物或（ii）由式（1）表示的化合物，自由基聚合引发剂和 选自由式（2）表示的二碲化合物中的至少一种化合物。 在式（1）和（2）中，R“S”为1-8C烷基，任选取代的芳基或芳族杂环基; R b 和R C 分别为H或1-8C烷基; 并且R“SP”是任选取代的芳基，芳族杂环基或酰基，氧羰基或氰基。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005075824A

公开(公告)日：2005-03-24

申请号：JP2003312281

申请日：2003-09-04

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  EHATA SATOSHI ,  O ISAMU

IPC: G03F7/004 ,  C07C23/38 ,  C07C309/19 ,  C07C309/80 ,  C07C381/12 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an acid generator free from problem of flammability and accumulation in the human body, generating an acid with high acidity and high boiling point, being suitably short in a diffusion distance in a resist film, and having a small dependency on degree of roughness and fineness of mask patterns, forming a resist pattern with improved nano edge roughness, a sulfonic acid generated from the acid generator, a suflonic acid derivative useful for raw material for synthesis of the acid generator, and a radiation-sensitive resin composition containing the acid generator. SOLUTION: The acid generator has a structure represented by general formula (I). Wherein R 1 is a monovalent substituent such as an alkoxyl group, an alkoxycarbonyl group or an alkylsulfonyl group, an alkoxysufonyl group or the like, m is an integer of >0, n is 1 or 2. The radiation-sensitive resin composition contains except the acid generator, an acid-dissociable-group-containing resin when it is a positive one; it contains an alkali-soluble resin and a crosslinking agent when it is a negative one. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种不存在人体易燃性和积聚问题的酸发生剂，产生酸度高，沸点高的酸，在抗蚀剂膜中的扩散距离适当短，并且具有 对掩模图案的粗糙度和细度的微小依赖性，形成具有改善的纳米边缘粗糙度的抗蚀剂图案，由酸产生剂产生的磺酸，用于合成酸产生剂的原料的磺化衍生物和辐射 含有酸发生剂的敏感性树脂组合物。 解决方案：酸产生剂具有由通式（I）表示的结构。 其中R <1> 是烷氧基，烷氧基羰基或烷基磺酰基，烷氧基磺酰基等的一价取代基，m为0以上的整数，n为1或2. 辐射敏感性树脂组合物除酸产生剂外还含有含酸解离基团的树脂，当其为阳性时; 当它是负的时，它含有碱溶性树脂和交联剂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004250427A

公开(公告)日：2004-09-09

申请号：JP2003182089

申请日：2003-06-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEDA EIJI ,  NISHIMURA YUKIO ,  O ISAMU

IPC: G03F7/004 ,  C07C381/12 ,  C08F2/50 ,  C09K3/00 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain an onium salt compound having excellent storage stability and suitable as a radiation-sensitive acid generator used in a radiation-sensitive resin composition useful as a chemical amplification type photoresist having high sensitivity and high resolution, the radiation-sensitive acid generator composed of the onium salt compound, and the positive-type radiation-sensitive resin composition containing the radiation-sensitive acid generator. SOLUTION: The onium salt compound has a cationic part expressed by formula (1) [A is I or S; (m) is an integer of ≥1; (n) is an integer of ≥0; (x) is an integer of 1-15; Ar 1 and Ar 2 are each a univalent (substituted)aromatic hydrocarbon group, or the like; and OZ is a sulfonic acid (ester) residue or a sulfinic acid (ester) residue]. The positive-type radiation-sensitive resin composition contains (A) the radiation-sensitive acid generator composed of the onium salt compound and (B) a resin containing an acid-dissociating group. COPYRIGHT: (C)2004,JPO&NCIPI

Abstract translation: 要解决的问题为了获得具有优异的储存稳定性并且适合作为用作用作具有高灵敏度和高分辨率的化学放大型光致抗蚀剂的辐射敏感性树脂组合物中的辐射敏感性酸产生剂的鎓盐化合物， 由鎓盐化合物组成的辐射敏感酸产生剂和含有辐射敏感性酸产生剂的正型辐射敏感性树脂组合物。 解决方案：鎓盐化合物具有由式（1）表示的阳离子部分[A是I或S; （m）为≥1的整数; （n）为≥0的整数; （x）为1-15的整数; Ar 1 和Ar 2 分别为一价（取代）芳烃基等; OZ是磺酸（酯）残基或亚磺酸（酯）残基]。 正型辐射敏感性树脂组合物含有（A）由鎓盐化合物构成的辐射敏感性酸产生剂和（B）含有酸解离基团的树脂。 版权所有（C）2004，JPO＆NCIPI

公开(公告)号：JP2004210670A

公开(公告)日：2004-07-29

申请号：JP2002380168

申请日：2002-12-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： EHATA SATOSHI ,  O ISAMU

IPC: G03F7/004 ,  C07C309/19 ,  C07C309/65 ,  C07C309/66 ,  C07D207/46 ,  C08F2/50 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a novel acid generator which is excellent in transparency to a radiation, generates an acid upon irradiation or heating, is nonproblematic in flammability and accumulation in the human body, and generates an acid having a high acidity and a high boiling point, being suitably short in a diffusion distance in a resist film, and having a small pattern dependency; and to provide, e.g., a radiation-sensitive resin composition containing the acid generator. SOLUTION: The acid generator has a structure represented by formula (1) or formula (2) (wherein R 1 is a hydrogen atom or a monovalent substituent; p is an integer of 1 or greater; Z 1 and Z 2 are each a fluorine atom or a perfluoroalkyl group; Y 1 is a single bond or a divalent group; R 2 is a monovalent or divalent substituent; q is an integer of 0 or greater; and n is an integer of 0 to 5). The radiation-sensitive resin composition contains the acid generator and an acid-dissociable-group-containing resin when it is a positive one; it contains the acid generator and an alkali-soluble resin and a crosslinking agent when it is a negative one. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2000327654A

公开(公告)日：2000-11-28

申请号：JP13503099

申请日：1999-05-14

Applicant: JSR CORP

Inventor： O ISAMU ,  KOBAYASHI HIDEKAZU

IPC: C07C309/27 ,  C08K5/42 ,  G03F7/004 ,  G03F7/029 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To obtain a new compound having a structure suitable for a commercial production, high sensitivity especially to far ultraviolet rays and a charged particle beam, not damaging a semiconductor, having no problem of volatilization, side reaction, dark reaction in resist preservation and occurrence of foreign matter, exhibiting high resolving power. SOLUTION: This composition is shown by formula I (X1 is a 2-10C ester bond-containing organic group; R1 is a 1-10C alkyl or the like; m is 1-11; n is 0-10 and m+n