公开(公告)号：US20200223125A1

公开(公告)日：2020-07-16

申请号：US16818003

申请日：2020-03-13

Applicant: Japan Science and Technology Agency

Inventor： Hiroshi Yabu ,  Yula Saito

IPC: B29C59/00 ,  B32B27/00 ,  G03F7/00 ,  C09D133/24 ,  C08F220/54 ,  B29C59/02 ,  C08F220/70

Abstract: Provided is a resin for nanoimprinting, which is capable of preventing removal of a transfer-receiving resin from a substrate when a mold is separated during nanoimprinting, and which is also capable of transferring a pattern on a mold to a transfer-receiving resin with high accuracy during thermal nanoimprinting, while improving the throughput. A resin for nanoimprinting, which is represented by formula (1). (In the formula, each of R1-R5 independently represents —H or —OH, and at least one of the R1-R5 moieties represents —OH; R6 represents a linear, branched or cyclic alkyl group having 1-20 carbon atoms, an aryl group having 6-20 carbon atoms or an aralkyl group having 7-20 carbon atoms; X represents an amide or an ester; Y may be absent, or represents an amide or an ester; P represents an integer of 1-10; and each of m and n represents an integer of 1 or more.)