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公开(公告)号：JP4282783B2
公开(公告)日：2009-06-24
申请号：JP36324397
申请日：1997-12-16
CPC classification number: G03F7/033 , G03F7/0007 , Y10S430/111 , Y10S430/116 , Y10S430/117
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Patent Agency Ranking
公开(公告)号：JP5083540B2
公开(公告)日：2012-11-28
申请号：JP2007329512
申请日：2007-12-21
Applicant: Jsr株式会社
IPC: C08G59/34 , C08L63/00 , G02F1/1333 , G03F7/033 , G03F7/40
CPC classification number: C09D201/08
Abstract: A radiation sensitive resin composition for forming a protective film, comprising: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy group-containing unsaturated compound and (a3) an unsaturated compound different from the components (a1) and (a2) ; [B] a monofunctional polymerizable unsaturated compound having a molecular weight of 180 or more and a carboxyl group; [C] a polyfunctional polymerizable unsaturated compound; and [D] a photopolymerization initiator, a method of forming a protective film from the above composition and a protective film formed from the above composition. The composition can provide a cured film having high flatness, has high developability and heat resistance, is advantageously used to form a protective film for liquid crystal display devices and solid-state image sensing devices, and has high storage stability as a composition.
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公开(公告)号：JP5218195B2
公开(公告)日：2013-06-26
申请号：JP2009072951
申请日：2009-03-24
Applicant: Jsr株式会社
IPC: C09D157/10 , C09D7/12 , C09D133/00 , C09D135/00 , C09D163/10 , G02B5/20 , G02F1/1333
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