公开(公告)号：JP2010066489A

公开(公告)日：2010-03-25

申请号：JP2008232436

申请日：2008-09-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  FUJIWARA KOICHI ,  WAKAMATSU TAKASHI ,  HORI MASASHI

IPC: G03F7/039 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition of which a first resist pattern is insolubilized to form an insolubilized resist pattern having sufficient stability to subsequent exposure, a developer and a second positive radiation-sensitive resin composition. SOLUTION: The positive radiation-sensitive resin composition contains a resin containing 5-65 mol% of a specific repeating unit and having an acid-dissociable group, and is used in step (1) of a resist pattern forming method including the steps of: (1) forming a first resist pattern; (2) applying a resist pattern insolubilizing resin composition on the first resist pattern to convert the first resist pattern to an insolubilized resist pattern; (3) forming a second resist layer on the insolubilized resist pattern and selectively exposing it; and (4) forming a second resist pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种正性辐射敏感性树脂组合物，其中第一抗蚀剂图案不溶解以形成对随后暴露的足够稳定性的不溶性抗蚀剂图案，显影剂和第二正性辐射敏感性树脂组合物。 阳离子敏感性树脂组合物含有含有5-65mol％的特定重复单元并具有酸解离基团的树脂，并且用于抗蚀剂图案形成方法的步骤（1）中，该抗蚀剂图案形成方法包括 步骤：（1）形成第一抗蚀剂图案; （2）在第一抗蚀剂图案上涂布抗蚀剂图案不溶化树脂组合物以将第一抗蚀剂图案转化为不溶化抗蚀剂图案; （3）在不溶解的抗蚀剂图案上形成第二抗蚀剂层并选择性地使其曝光; 和（4）形成第二抗蚀剂图案。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011081041A

公开(公告)日：2011-04-21

申请号：JP2009230834

申请日：2009-10-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： WAKAMATSU TAKASHI ,  ANNO YUSUKE ,  HORI MASASHI ,  YADA YUJI

IPC: G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist pattern coating agent which can suppress top loss of a resist patten, improving LWR, and achieving insolubilization of the resist pattern to improve curing property of the resist pattern. SOLUTION: The resist pattern coating agent includes a resin having a hydroxyl group, and a solvent containing at least either of a compound represented by general formula (1): R 1 -O-R 2 or a compound represented by general formula (2): R 3 -OH. A total content ratio of the compound represented by the general formula (1) and the compound represented by the general formula (2) is 10 mass% or more in 100 mass% of the solvent. In the general formula (1), each of R 1 and R 2 is a 3C-10C alkyl group or the like which may be replaced with fluorine. In the general formula (2), R 3 is a 1C-5C alkyl group or the like which may be replaced with fluorine. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以抑制抗蚀剂图案的顶部损失，改善LWR并且实现抗蚀剂图案的不溶化以提高抗蚀剂图案的固化性能的抗蚀剂图案涂布剂。 解决方案：抗蚀剂图案涂布剂包括具有羟基的树脂和包含通式（1）表示的化合物中的至少一种的溶剂：R SP 1 -OR SP 2或由通式（2）表示的化合物：R 3 SP 3。 由通式（1）表示的化合物和通式（2）表示的化合物的总含有比例在100质量％的溶剂中为10质量％以上。 在通式（1）中，R“SP 1”和“R”2“中的每一个是可被氟代替的3C-10C烷基等。 在通式（2）中，R 3是可被氟代替的1C-5C烷基等。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011033884A

公开(公告)日：2011-02-17

申请号：JP2009180855

申请日：2009-08-03

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： FUJIWARA KOICHI ,  MITA MICHIHIRO ,  KAKIZAWA TOMOHIRO ,  HORI MASASHI

IPC: G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist pattern coating agent used in a resist pattern forming method easily and efficiently forming a fine resist pattern. SOLUTION: The resist pattern coating agent contains a resin having a hydroxyl group, a crosslinking agent, a solvent, and a nitrogen-containing compound. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种抗蚀剂图案形成方法中使用的抗蚀剂图案涂布剂，其容易且有效地形成精细抗蚀剂图案。 抗蚀剂图案涂布剂含有具有羟基的树脂，交联剂，溶剂和含氮化合物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011053643A

公开(公告)日：2011-03-17

申请号：JP2010075604

申请日：2010-03-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： WAKAMATSU TAKASHI ,  HORI MASASHI ,  MITA MICHIHIRO

IPC: G03F7/40 ,  C08F20/18 ,  C08F20/22 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist pattern forming method which, in double patterning, can form a second resist pattern while retaining a first resist pattern without dissolving the first resist agent in the second resist agent, and which can suppress a line width variation of the first resist pattern and is suitably adopted even for a liquid immersion exposure process. SOLUTION: The resist pattern forming method includes a step (1) of forming a first resist pattern on a substrate with a first radiation-sensitive resin composition comprising a polymer (A1) and a solvent in which the polymer (A1) is soluble, and a step (2) of forming a second resist pattern with a second radiation-sensitive resin composition comprising a polymer (A2) and an alcoholic solvent in which the polymer (A2) is soluble, wherein the polymer (A1) and the first resist pattern are insoluble in the alcoholic solvent. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 解决的问题：提供一种抗蚀剂图案形成方法，其在双重构图中可以形成第二抗蚀剂图案，同时保持第一抗蚀剂图案而不将第一抗蚀剂溶解在第二抗蚀剂中，并且可以抑制 第一抗蚀剂图案的线宽变化，并且适用于液浸曝光处理。 抗蚀剂图案形成方法包括：在基材上形成第一抗蚀剂图案的步骤（1），该第一抗蚀剂图案包含聚合物（A1）和聚合物（A1）为 以及使用包含聚合物（A2）和其中可溶于聚合物（A2）的醇溶剂的第二辐射敏感性树脂组合物形成第二抗蚀剂图案的步骤（2），其中聚合物（A1）和 第一抗蚀剂图案不溶于醇溶剂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250263A

公开(公告)日：2010-11-04

申请号：JP2009229348

申请日：2009-10-01

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： WAKAMATSU TAKASHI ,  HORI MASASHI

IPC: G03F7/40 ,  C08F20/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern, with which a finer resist pattern with a controlled line width change can be formed readily and efficiently, while reducing the occurrence of damages. SOLUTION: The method for forming a resist pattern includes a step (1) of forming an insolubilized resist pattern, by using a resin composition for insolubilizing a resist pattern, the composition containing a polymer having a repeating unit expressed by formula (1) (wherein R 1 represents a hydrogen atom, or the like, and R 2 represents a methylene group, or the like) and a solvent; a step (2) of forming a resist layer on a substrate, where the insolubilized resist pattern is formed and selectively exposing the resist layer; and a step (3) of forming a second resist pattern. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种形成抗蚀剂图案的方法，通过该方法可以容易且有效地形成具有受控线宽度变化的更精细的抗蚀剂图案，同时减少损坏的发生。 解决方案：形成抗蚀剂图案的方法包括通过使用用于使抗蚀剂图案不溶化的树脂组合物形成不溶化抗蚀剂图案的步骤（1），该组合物含有具有由式（1）表示的重复单元的聚合物 ）（其中R 1表示氢原子等，R SP 2表示亚甲基等）和溶剂; 在基板上形成抗蚀剂层的步骤（2），其中形成不溶的抗蚀剂图案并选择性地暴露抗蚀剂层; 以及形成第二抗蚀剂图案的步骤（3）。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010210751A

公开(公告)日：2010-09-24

申请号：JP2009054664

申请日：2009-03-09

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： WAKAMATSU TAKASHI ,  HORI MASASHI ,  YAMAGUCHI KEIICHI

IPC: G03F7/40 ,  C08F20/18 ,  C08F20/58 ,  G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a coating agent for a resist pattern, which is excellent in performance (curing performance) of insolubilizing and curing a resist pattern, and allows an insoluble resist pattern which is sufficiently stable against a subsequent exposure process, a developing solution and a positive radiation-sensitive resin composition. SOLUTION: The coating agent for a resist pattern contains: (I) a resin having a structural unit derived from at least one monomer of hydroxyacrylanilide and hydroxymethacrylanilide; and (II) a radical generator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种抗蚀剂图案用涂料，其具有优异的不溶化和固化抗蚀剂图案的性能（固化性能），并且允许对后续曝光过程足够稳定的不溶性抗蚀剂图案 ，显影液和正性辐射敏感性树脂组合物。 抗蚀剂图案用涂布剂含有：（I）具有衍生自羟基丙烯酰苯胺和羟基甲基丙烯酰苯胺的至少一种单体的结构单元的树脂; 和（II）自由基发生器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010096992A

公开(公告)日：2010-04-30

申请号：JP2008267819

申请日：2008-10-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAKAMURA ATSUSHI ,  KAKIZAWA TOMOHIRO ,  WAKAMATSU TAKASHI ,  HORI MASASHI ,  ANNO YUSUKE

IPC: G03F7/40 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for forming a resist pattern, by which a finer resist pattern can be easily and efficiently formed. SOLUTION: The method for forming the resist pattern includes steps of: (1) converting a first resist pattern group including each plurality of first pattern portions and first space portions into an insoluble resist pattern group insoluble with a predetermined positive radiation-sensitive resin composition; (2) forming a resist layer on the first pattern portions and in the first space portions by using the positive radiation-sensitive resin composition and selectively exposing the formed resist layer through a mask; and (3) developing the layer to form a second pattern portion at least partially overlapping the first pattern portion while partially exposing the upper face of at least one first pattern portion, and thereby forming a second pattern group having a plurality of composite pattern portions in which the first pattern portions and the second pattern portions are combined. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种形成抗蚀剂图案的方法，通过该方法可以容易且有效地形成更细的抗蚀剂图案。 解决方案：形成抗蚀剂图案的方法包括以下步骤：（1）将包括每个第一图案部分和第一间隔部分的第一抗蚀剂图案组转换成不可溶于预定的阳性辐射敏感的不溶性抗蚀剂图案组 树脂组成; （2）通过使用正性辐射敏感性树脂组合物在第一图案部分和第一空间部分中形成抗蚀剂层，并通过掩模选择性地曝光所形成的抗蚀剂层; 和（3）显影该层以形成至少部分地与第一图案部分重叠的第二图案部分，同时部分地暴露至少一个第一图案部分的上表面，从而形成具有多个复合图案部分的第二图案组 其中第一图案部分和第二图案部分被组合。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010066492A

公开(公告)日：2010-03-25

申请号：JP2008232443

申请日：2008-09-10

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  FUJIWARA KOICHI ,  WAKAMATSU TAKASHI ,  HORI MASASHI ,  KAKIZAWA TOMOHIRO

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive resin composition which easily and efficiently forms a fine resist pattern without practically generating scum between parts of an insolubilized first resist pattern. SOLUTION: The positive radiation-sensitive resin composition contains a specific photodegradable base and is used in step (3) of a resist pattern forming method including the steps of: (1) forming a first resist pattern; (2) applying a resist pattern insolubilizing resin composition on the first resist pattern to convert the first resist pattern to an insolubilized resist pattern; (3) forming a second resist layer on the insolubilized resist pattern and selectively exposing it; and (4) forming a second resist pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种容易有效地形成精细抗蚀剂图案的正性辐射敏感性树脂组合物，而不会在不溶化的第一抗蚀剂图案的部分之间实际上产生浮渣。 阳离子敏感性树脂组合物含有特定的光降解性基材，并且在抗蚀剂图案形成方法的步骤（3）中使用，包括以下步骤：（1）形成第一抗蚀剂图案; （2）在第一抗蚀剂图案上涂布抗蚀剂图案不溶化树脂组合物以将第一抗蚀剂图案转化为不溶化抗蚀剂图案; （3）在不溶解的抗蚀剂图案上形成第二抗蚀剂层并选择性地使其曝光; 和（4）形成第二抗蚀剂图案。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010044164A

公开(公告)日：2010-02-25

申请号：JP2008207063

申请日：2008-08-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： FUJIWARA KOICHI ,  KAKIZAWA TOMOHIRO ,  HORI MASASHI ,  WAKAMATSU TAKASHI

IPC: G03F7/40 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist pattern-forming method which easily, efficiently forms finer resist patterns. SOLUTION: The resist pattern-forming method includes: (1) a process in which a resin composition, which makes a resist pattern insoluble, is applied to a first resist pattern, and development is carried out after baking or UV curing, and the first resist pattern is made to be an insoluble resist pattern having a plurality of first line parts and first space parts; (2) a process in which resist layers formed in the first space parts by using a positive-type radiation-sensitive resin composition are selectively subjected to exposure via a mask; and (3) a process in which development is carried out to form second line parts in the first space parts, and a second resist pattern is formed, the second resist pattern having the first line parts, the second line parts, and one or more second space parts whose widths (W 2 ) are over 0% and at most 30% of the widths (W 1 ) of the first space parts, the second space parts being formed between the first and second line parts. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够有效地形成更好的抗蚀剂图案的抗蚀剂图案形成方法。 抗蚀剂图案形成方法包括：（1）将抗蚀剂图案不溶的树脂组合物施加到第一抗蚀剂图案上的方法，并且在烘烤或UV固化后进行显影， 并且将第一抗蚀剂图案制成具有多个第一线部分和第一空间部分的不溶性抗蚀剂图案; （2）通过使用正型放射线敏感性树脂组合物在第一空间部中形成的抗蚀剂层经由掩模选择性地进行曝光的工序; 和（3）进行显影以在第一空间部分中形成第二线部分的工艺，并且形成第二抗蚀剂图案，第二抗蚀剂图案具有第一线部分，第二线部分和一个或多个 其宽度（W 2 ）超过第一空间部分的宽度（W 1 ）的0％和至多30％的第二空间部分，第二空间部分 形成在第一和第二线部分之间。 版权所有（C）2010，JPO＆INPIT