公开(公告)号：JP2003270788A

公开(公告)日：2003-09-25

申请号：JP2002073000

申请日：2002-03-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OKAMOTO KENJI ,  KUROKAWA MITSUO

IPC: G03F7/039 ,  C08F20/18 ,  C08F20/28 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to a radiation, satisfying basic performances required by a resist, such as sensitivity, resolution, dry etching resistance and pattern shape and free of occurrence and increase of foreign matter in resist storage.
SOLUTION: The radiation sensitive resin composition comprises an acid- dissociating group-containing resin which is alkali-insoluble or slightly alkali- soluble and becomes readily alkali-soluble under the action of an acid and a radiation sensitive acid generator, wherein the amount of a monomer-based low molecular weight component contained in the acid-dissociating group- containing resin is ≤0.5 wt.% (expressed in terms of solid matter) of the total amount of the resin.
COPYRIGHT: (C)2003,JPO

Abstract translation: 要解决的问题：提供对辐射具有高透明度的辐射敏感性树脂组合物，满足抗蚀剂所需的基本性能，例如灵敏度，分辨率，耐干蚀刻性和图案形状，并且不会发生外来物质的发生和增加 抗蚀剂存储中的物质。 解决方案：辐射敏感性树脂组合物包含碱解不溶性或略碱溶性的酸解离基团的树脂，并且在酸和辐射敏感性酸产生剂的作用下容易碱溶，其中 含有酸解离基团的树脂中所含的基于单体的低分子量组分的量相对于树脂总量为≤0.5重量％（以固体物质表示）。 版权所有（C）2003，JPO

公开(公告)号：JP2003280201A

公开(公告)日：2003-10-02

申请号：JP2002083930

申请日：2002-03-25

Applicant: Jsr Corp ,  Jsr Micro Inc ,  Jsr株式会社 ,  ジェイエスアール マイクロ インコーポレイテッド

Inventor： SANO KIMIYASU ,  NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KUROKAWA MITSUO ,  MARK SLEZAK

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition useful as a chemically amplified resist excellent in basic physical properties as a resist as well as in terms of an exposure window. SOLUTION: The radiation sensitive resin composition comprises (A) two or more acid-dissociating group-containing resins which have at least one of formulae (1)-(4) as a repeating unit, become alkali-soluble by dissociation of the acid-dissociating group, contain the same acid-dissociating group and have mutually different acid-dissociating group contents and (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供可用作抗蚀剂的基本物理性能优异的化学放大抗蚀剂以及曝光窗口的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）两种或多种具有至少一个式（1） - （4）作为重复单元的含酸解离基团的树脂，其通过解离形成碱溶性 酸解离基团含有相同的酸解离基团并且具有相互不同的酸解离基团含量，和（B）在用光化射线或辐射照射时产生酸的化合物。 版权所有（C）2004，JPO

公开(公告)号：JP2007186713A

公开(公告)日：2007-07-26

申请号：JP2007089528

申请日：2007-03-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OKAMOTO KENJI ,  KUROKAWA MITSUO

IPC: C08F6/06 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a radiation-sensitive resin composition having high transparency to radiation, satisfying basic properties required for a resist such as sensitivity, resolution, dry etching resistance and pattern shape, hardly causing generation or increase of a foreign matter under preservation of a resist, and suitably usable as a chemical amplification-type resist. SOLUTION: The method for producing the radiation-sensitive resin composition is characterized in that the composition contains an acid-dissociable group-containing resin insoluble or slightly soluble in alkali, and becoming alkali soluble by the action of an acid, and a radiation-sensitive acid-generating agent. The acid-dissociable group-containing resin has a content, of a low-molecular weight component consisting essentially of a monomer contained in the resin, of ≤0.5 wt.% based on the whole resin in terms of solid content. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决问题的方案为了提供一种对辐射透明度高的辐射敏感性树脂组合物的制造方法，满足抗敏剂所要求的基本性能，例如灵敏度，分辨率，耐干蚀刻性和图案形状，几乎不产生或产生 在保护抗蚀剂的同时增加异物，并且适合用作化学放大型抗蚀剂。 解决方案：用于制造辐射敏感性树脂组合物的方法的特征在于，该组合物含有不溶于或略溶于碱的含酸解离性基团的树脂，并通过酸的作用变成碱溶性， 辐射敏感性酸产生剂。 含有酸解离基团的树脂的固体含量相对于整个树脂，其含量基本上由树脂中所含的单体构成的低分子量组分的含量为≤0.5重量％。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2003322971A

公开(公告)日：2003-11-14

申请号：JP2002127446

申请日：2002-04-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  KATAOKA ATSUKO ,  KUROKAWA MITSUO

IPC: G03F7/039 ,  C08F20/18 ,  C08F32/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition as a chemically amplifying resist which is sensitive to active radiation, for example, far UV rays represented by KrF excimer laser or ArF excimer laser and which can form a resist pattern with excellent uniformity in film thickness, excellent adhesion property with a substrate, accuracy, sensitivity, resolution and so on.
SOLUTION: The radiation sensitive resin composition contains: (A) an alkali insoluble or alkali hardly soluble resin containing an acid-dissociable group which changes into alkali soluble when the acid dissociable group is dissociated; (B) a radiation sensitive acid producing agent; and (C) a compound expressed by general formula (1) as a solvent.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种对活性辐射敏感的化学放大抗蚀剂的辐射敏感性树脂组合物，例如由KrF准分子激光或ArF准分子激光器表示的远紫外线，并且可以形成具有 优异的膜厚均匀性，与基材的附着性优异，精度高，灵敏度高，分辨率高等特点。 解决方案：辐射敏感性树脂组合物包含：（A）当酸解离基解离时，含有可溶解酸碱解的基团的碱不溶性或碱难溶性树脂变为碱溶性; （B）辐射敏感性产酸剂; 和（C）由通式（1）表示的化合物作为溶剂。 版权所有（C）2004，JPO

公开(公告)号：JP2002131896A

公开(公告)日：2002-05-09

申请号：JP2001330076

申请日：2001-10-29

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  KUROKAWA MITSUO ,  ANO TAKIO ,  TSUJI AKIRA

IPC: G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition which is excellent in coating applicability on a substrate of large diameter using spin-coating method and suitable for manufacturing a semiconductor IC. SOLUTION: The radiation sensitive resin composition contains an alkali- soluble resin, a radiation sensitive compound and a solvent. The solvent is the mixture of an alkyl lactate, an ester made from an aliphatic carboxylic acid having 1-4 carbon atoms without substituent and an alcohol having 1-6 carbon atoms.