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1.发明专利Radiation sensitive resin composition, interlayer dielectric, and microlens, and method of producing the same 有权辐射敏感性树脂组合物，中间层介电材料和微晶玻璃及其制造方法
公开(公告)号：JP2009229567A
公开(公告)日：2009-10-08
申请号：JP2008072063
申请日：2008-03-19
Inventor： HAMADA KENICHI , NAGAYA MASAYA , ONUMA YUUKI , HANAMURA MASAAKI , IIJIMA TAKAHIRO
Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition with which an interlayer dielectric having high surface hardness, excellent heat resistance and solvent resistance, and further having low dielectric constant can be formed, and with which a microlens with an excellent melted shape can be formed. SOLUTION: The radiation sensitive resin composition includes: a copolymer of a mixture of unsaturated compounds containing at least one selected from a group comprising an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and an unsaturated compound having an oxetanyl group; a 1,2-quinonediazide compound; and a carboxylic acid with a molecular weight of ≤1,000. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种具有高表面硬度，优异的耐热性和耐溶剂性并且还具有低介电常数的层间电介质的辐射敏感性树脂组合物，并且可以形成具有优异的微透镜 可以形成熔化的形状。 解决方案：辐射敏感性树脂组合物包括：含有选自不饱和羧酸和不饱和羧酸酐的基团中的至少一种的不饱和化合物的混合物和具有氧杂环丁烷基的不饱和化合物的共聚物; 1,2-醌二叠氮化合物; 和分子量≤1,000的羧酸。 版权所有（C）2010，JPO＆INPIT
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