公开(公告)号：JP2010265435A

公开(公告)日：2010-11-25

申请号：JP2009191426

申请日：2009-08-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MATSUMURA SHINJI ,  NISHIMURA YUKIO ,  SOYANO AKIMASA ,  SERIZAWA RYUICHI ,  OTSUKA NOBORU ,  TOMIOKA HIROSHI

IPC: C08L33/14 ,  C07C311/09 ,  C07C381/12 ,  C08F220/38 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a resist pattern having a small LWR and an excellent pattern form. SOLUTION: The radiation-sensitive resin composition comprises (A) a polymer having a specific sulfonamide group on its side chain, and (B) a radiation-sensitive acid generating agent. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够形成具有小LWR和优异图案形式的抗蚀剂图案的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）侧链上具有特定磺酰胺基团的聚合物和（B）辐射敏感性酸产生剂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011215429A

公开(公告)日：2011-10-27

申请号：JP2010084494

申请日：2010-03-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  TOMIOKA HIROSHI ,  SERIZAWA RYUICHI ,  OIZUMI YOSHIJI

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition nearly free from development defect and to provide a polymer used therefor.SOLUTION: The radiation sensitive resin composition contains a polymer (A)having a carbonyl group on at least one terminal of a molecular chain, having weight average molecular weight in terms of polystyrene by gel permeation chromatography of ≥11,000 and decomposed by action of an acid and increasing solubility in an alkali developer and a radiation-sensitive acid generator (B).

Abstract translation: 要解决的问题：提供几乎不含显影缺陷的辐射敏感性树脂组合物，并提供用于其的聚合物。解决方案：辐射敏感性树脂组合物含有在分子的至少一个末端具有羰基的聚合物（A） 链，通过凝胶渗透色谱法测定聚苯乙烯的重均分子量≥11,000，并通过酸的作用分解并增加在碱性显影剂和辐射敏感性酸产生剂（B）中的溶解度。

公开(公告)号：JP2010237563A

公开(公告)日：2010-10-21

申请号：JP2009087077

申请日：2009-03-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SERIZAWA RYUICHI ,  MATSUMURA SHINJI ,  WAKAMATSU TAKASHI

IPC: G03F7/004 ,  C08F20/10 ,  C08K5/1545 ,  C08L101/02 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition which, as a chemically amplified resist, is high in transparency to radiation and superior in resolution and is not only superior in dry-etching resistance, sensitivity, and pattern shape or the like, but also remarkably improves the yield of semiconductor elements by suppressing the occurrence of development defects during microfabrication. SOLUTION: The radiation sensitive resin composition includes a resin (A) including an acid dissociable group, a compound (B) which generates an acid by irradiation with active light or radiation, and a compound (C) which includes a cyclodextrin skeleton and a fluorine atom in a molecular structure and includes ≤6,000 average molecular weight calculated from 1 H NMR. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，其作为化学放大型抗蚀剂，其对辐射的透明度高，分辨率优异，并且不仅在干蚀刻电阻，灵敏度和图案形状方面优异， 而且通过抑制微细加工时的显影缺陷的发生，显着地提高了半导体元件的成品率。 解决方案：辐射敏感性树脂组合物包括包含酸解离基团的树脂（A），通过用活性光或辐射照射产生酸的化合物（B）和包含环糊精骨架的化合物（C） 和分子结构中的氟原子，并且包括从 1 H NMR计算的≤6,000的平均分子量。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2013205837A

公开(公告)日：2013-10-07

申请号：JP2012078436

申请日：2012-03-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SERIZAWA RYUICHI ,  IKEDA NORIHIKO

IPC: G03F7/039 ,  C08F220/10 ,  C08F224/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition excellent in LWR (line width roughness) performance, MEEF (mask error enhancement factor) performance and DOF (depth of focus) performance.SOLUTION: The photoresist composition comprises [A] a polymer having a structural unit (I) expressed by a formula (1) and a structural unit (II) expressed by a formula (2), and [B] an acid generator.

Abstract translation: 要解决的问题：提供LWR（线宽粗糙度）性能，MEEF（掩模误差增强因子）性能和DOF（深度聚焦）性能优异的光致抗蚀剂组合物。解决方案：光致抗蚀剂组合物包含[A]具有 由式（1）表示的结构单元（I）和由式（2）表示的结构单元（II），和[B]酸产生剂。

公开(公告)号：JP2010250279A

公开(公告)日：2010-11-04

申请号：JP2010017785

申请日：2010-01-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： OIZUMI YOSHIJI ,  OTSUKA NOBORU ,  SOYANO AKIMASA ,  SERIZAWA RYUICHI ,  TOMIOKA HIROSHI

IPC: G03F7/039 ,  C07C19/07 ,  C07C309/06 ,  C07C309/12 ,  C07C381/12 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition, which is free from problems of a radiation-sensitive acid generator, having a perfluoroalkyl sulfonyl structure such as PFOS (perfluoro-n-octane sulfonic acid), which has characteristics of excellent resolution performance, no vaporization of an acid generated by exposure, and an appropriately short diffusion length, and which gives a small LWR (line width roughness) as an index of fluctuation in the line width of a resist pattern, and can give a resist pattern having a small film reduction. SOLUTION: The radiation-sensitive resin composition comprises (A) a radiation-sensitive acid generator, having a partial fluoroalkyl structure and (B) a resin having a specified cyclic carbonate structure. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有全氟烷基磺酰结构如PFOS（全氟正辛烷磺酸）的辐射敏感性酸产生剂的问题的辐射敏感性树脂组合物，其具有 具有优异的分辨率性能，曝光产生的酸不蒸发，扩散长度短的优点，作为抗蚀剂图案的线宽度的波动指数，LWR（线宽粗糙度）小，能够得到 具有小的膜还原的抗蚀剂图案。 解决方案：辐射敏感性树脂组合物包含（A）具有部分氟烷基结构的辐射敏感性酸产生剂和（B）具有特定环状碳酸酯结构的树脂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2013083935A

公开(公告)日：2013-05-09

申请号：JP2012176397

申请日：2012-08-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SERIZAWA RYUICHI ,  ASANO YUSUKE

IPC: G03F7/004 ,  C08F20/26 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0392 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition capable of suppressing development defects while ensuring hydrophobicity during immersion exposure.SOLUTION: The photoresist composition comprises: [A] a fluorine atom-containing polymer having a structural unit (I) including a hydrophilic group; [B] a fluorine atom-containing polymer having a structural unit (II) including an alkali-dissociable group; and [C] a polymer having an acid-dissociable group. The polymer [A], the polymer [B] and the polymer [C] are polymers different from one another.

Abstract translation: 要解决的问题：提供能够在浸渍曝光期间确保疏水性的同时抑制显影缺陷的光致抗蚀剂组合物。 光致抗蚀剂组合物包含：[A]具有包含亲水基团的结构单元（I）的含氟原子的聚合物; [B]具有含有碱解离基团的结构单元（II）的含氟原子的聚合物; 和[C]具有酸解离基团的聚合物。 聚合物[A]，聚合物[B]和聚合物[C]是彼此不同的聚合物。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012093706A

公开(公告)日：2012-05-17

申请号：JP2011073725

申请日：2011-03-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SERIZAWA RYUICHI ,  KASAHARA KAZUKI ,  HOSHIKO KENJI ,  NAKAJIMA HIROMITSU ,  ISHIKAWA HIRONARI ,  SOYANO AKIMASA

IPC: G03F7/039 ,  C08F20/26 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which improves pattern rectangularity in addition to LWR for a line-and-space pattern, as well as circularity for a contact hole pattern and circularity holding capability for a narrow pitch pattern, suitable for liquid immersion process for a line width of 45 nm or less; and a pattern formation method using the same.SOLUTION: A radiation-sensitive resin composition contains a polymer [A] having a structural unit (I) represented by the following formula (1) and an acid generating material [B] including a compound represented by the following formula (2).

Abstract translation: 解决的问题：提供除了用于线间距图案的LWR以外还提高图案矩形性的辐射敏感性树脂组合物以及用于接触孔图案的圆形度和窄间距的圆形度保持能力 图案，适用于45nm以下线宽的液浸工艺; 以及使用该图案形成方法的图案形成方法。 解决方案：辐射敏感性树脂组合物含有具有由下式（1）表示的结构单元（I）的聚合物[A]和包含由下式（2）表示的化合物的酸产生物质[B] ）。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012088574A

公开(公告)日：2012-05-10

申请号：JP2010235989

申请日：2010-10-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MATSUDA YASUHIKO ,  KAKIZAWA TOMOHIRO ,  KIMOTO TAKAKAZU ,  ASANO YUSUKE ,  SATO MITSUHISA ,  SERIZAWA RYUICHI ,  ISHII TAKESHI

IPC: G03F7/039 ,  C08F20/22

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which suppresses generation of particles in liquid even after a long-term storage, has excellent radiation sensitivity, has small temporal variation in characteristics such as a high backward contact angle in exposure, and has excellent storage stability.SOLUTION: In the radiation-sensitive resin composition which contains [A] a fluorine-containing polymer having (f) a structural unit including a base-dissociable group, the total content of metal is 30 mass ppb or less. The metal is sodium, magnesium or iron, and each of the contents of the sodium, the magnesium and the iron is 3 mass ppb or less. The base-dissociable group of the structural unit (f) preferably has a fluorine atom, and further preferably is an aromatic hydrocarbon group having the fluorine atom.

Abstract translation: 解决问题的方案为了提供即使在长期储存后抑制液体中的颗粒的产生的辐射敏感性树脂组合物，具有优异的辐射敏感性，具有小的时间变化，例如高反向接触角 曝光，并具有优良的储存稳定性。 解决方案：在含有[A]具有（f）包含碱解离基团的结构单元的含氟聚合物的辐射敏感性树脂组合物中，金属的总含量为30质量ppm以下。 金属是钠，镁或铁，钠，镁和铁的每种含量为3质量ppm以下。 结构单元（f）的碱解离基优选具有氟原子，进一步优选为具有氟原子的芳香族烃基。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012078510A

公开(公告)日：2012-04-19

申请号：JP2010222790

申请日：2010-09-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SERIZAWA RYUICHI ,  SOYANO AKIMASA ,  ASANO YUSUKE ,  ISHII TAKESHI ,  KAKIZAWA TOMOHIRO ,  MATSUDA YASUHIKO ,  KIMOTO TAKAKAZU

IPC: G03F7/004 ,  C08F220/22 ,  C08F220/26 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition suppressing generation of particles in a liquid of the composition even when stored for a long period of time, and having excellent storage stability as showing little change with time in characteristics such as superior sensitivity to radiation and a high receding contact angle during exposure.SOLUTION: The radiation-sensitive resin composition contains: a fluorine-containing polymer (A) including a structural unit (f1) having a base-dissociable group; a compound (C) that generates an acid by irradiation with radiation; and a salt (D) that generates a compound having a specified pKa by irradiation with radiation.

Abstract translation: 解决的问题：为了提供即使在长时间储存​​时抑制组合物的液体中的颗粒的产生，并且具有优异的储存稳定性的放射线敏感性树脂组合物，其特性如下 作为对辐射的优良敏感性和曝光期间的高后退接触角。 解决方案：辐射敏感性树脂组合物含有：包含具有碱解离基团的结构单元（f1）的含氟聚合物（A） 通过辐射照射产生酸的化合物（C）; 和通过辐射照射产生具有特定pKa的化合物的盐（D）。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2013068914A

公开(公告)日：2013-04-18

申请号：JP2011209301

申请日：2011-09-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  OIZUMI YOSHIJI ,  SERIZAWA RYUICHI ,  KAKIZAWA TOMOHIRO ,  ASANO YUSUKE ,  MATSUDA YASUHIKO ,  SUGIE NORIHIKO

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition with which a resist pattern having fewer development defects and good pattern features can be formed.SOLUTION: The photoresist composition comprises: [A] a base polymer having a structural unit (I) containing an acid dissociable group; [B] a polymer having a structural unit (II) containing a base dissociable group and having a higher percentage of fluorine atom content than that of the polymer [A]; and [C] an acid generating compound. The polymer [A] has a weight average molecular weight in terms of polystyrene of 10,000 or more and 40,000 or less. It is suitable that the base dissociable group has a fluorine atom. It is more suitable that the base dissociable group is an aromatic hydrocarbon group. The structural unit (II) is suitably represented by the formula (2).

Abstract translation: 要解决的问题：提供可以形成具有较少显影缺陷和良好图案特征的抗蚀剂图案的光致抗蚀剂组合物。 光致抗蚀剂组合物包含：[A]具有含有酸解离基团的结构单元（I）的基础聚合物; [B]具有含有碱解离基团并且具有比聚合物[A]的氟原子含量高的比例的结构单元（II）的聚合物; 和[C]酸产生化合物。 聚合物[A]的聚苯乙烯换算重量平均分子量为10,000以上且40,000以下。 碱解离基团具有氟原子是合适的。 碱解离基是芳烃基更合适。 结构单元（II）适当地由式（2）表示。 版权所有（C）2013，JPO＆INPIT