公开(公告)号：JP2003345020A

公开(公告)日：2003-12-03

申请号：JP2002151225

申请日：2002-05-24

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  NISHIMURA ISAO ,  KOBAYASHI HIDEKAZU

IPC: G03F7/039 ,  C08F32/08 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a composition having high transparency for radiation at short wavelengths, excellent solubility with a developer and excellent sensitivity, pattern profile and etching resistance. SOLUTION: The radiation-sensitive resin composition contains a resin having a functional group which increases solubility with an alkali by the effect of an acid, and a radiation-sensitive acid generating agent. The resin has a repeating unit expressed by formula (1). In formula (1), R independently represents a hydrogen atom, a 1-4C alkyl group or a 1-4C perfluoroalkyl group, R 1 represents a hydrocarbon group or an oxygen-containing hydrocarbon group, n is 0 or 1 and m is 1 or 2. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种具有高透射度的组合物，其具有短波长的辐射，与显影剂的溶解性优异，并且具有优异的灵敏度，图案轮廓和耐蚀刻性。 解决方案：辐射敏感性树脂组合物含有具有官能团的树脂，该树脂具有通过酸的作用使碱对碱的溶解度增加和辐射敏感性酸产生剂。 树脂具有由式（1）表示的重复单元。 在式（1）中，R独立地表示氢原子，1-4C烷基或1-4C全氟烷基，R 表示烃基或含氧烃基，n是 0或1，m为1或2.版权所有（C）2004，JPO

公开(公告)号：JP2003295440A

公开(公告)日：2003-10-15

申请号：JP2002093942

申请日：2002-03-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU ,  NISHIMURA YUKIO ,  YAMAMOTO MASASHI

IPC: G03F7/039 ,  C08G63/66 ,  C08G65/04 ,  G03F7/032 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new acid-dissociating group-containing resin and a radiation-sensitive resin composition having high transparency to a radiation, satisfying basic performances required by a resist, such as sensitivity, resolution, dry etching resistance and pattern shape, excellent in adhesiveness to a substrate, causing no development defect in microfabrication and capable of producing semiconductor devices in a high yield.
SOLUTION: The acid-dissociating group-containing resin is alkali-insoluble or slightly alkali-soluble, becomes readily alkali-soluble by the action of an acid and contains a repeating unit containing an ether bond in the principal chain. The radiation-sensitive resin composition comprises the acid-dissociating group-containing resin and a radiation-sensitive acid generator.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种新的含酸解离基团的树脂和对辐射具有高透明度的辐射敏感性树脂组合物，满足抗蚀剂所需的基本性能，例如灵敏度，分辨率，耐干蚀刻性 和图案形状，与基板的粘附性优异，在微细加工中不产生显影缺陷，并且能够以高产率制造半导体器件。 解决方案：含酸解离基团的树脂是碱不溶性或轻微碱溶性的，通过酸的作用变得容易碱溶，并含有在主链中含有醚键的重复单元。 辐射敏感性树脂组合物包含含酸解离基团的树脂和辐射敏感性酸发生剂。 版权所有（C）2004，JPO

公开(公告)号：JP2009037258A

公开(公告)日：2009-02-19

申请号：JP2008270285

申请日：2008-10-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHIMA MOTOYUKI ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  MATSUDA DAIICHI ,  NAKAMURA ATSUSHI

IPC: G03F7/039 ,  C08F220/18 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0397 ,  Y10S430/122

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition useful as a chemically amplified resist having high transmittance of radiation and excelling in sensitivity, resolution, dry etching resistance and pattern profile. SOLUTION: The radiation-sensitive resin composition comprises (A) resin having at least two recurring units selected out of recurring units derived from (meta) acrylic ester having a specific alicyclic hydrocarbon group, in the total amount of 5-70 mol% but each in the amount of 1-49 mol%, the resin being insoluble or scarcely soluble in alkali, but becoming easily soluble in alkali by the action of an acid, and (B) a photoacid generator. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可用作具有高辐射透射率和优异的灵敏度，分辨率，耐干蚀刻性和图案轮廓的化学放大抗蚀剂的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）具有至少两个从具有特定脂环族烃基的（甲基）丙烯酸酯衍生的重复单元中选出的重复单元的树脂，其总量为5-70mol ％，但各自为1-49mol％，树脂不溶或几乎不溶于碱，但通过酸作用容易溶于碱，（B）光酸产生剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2004210910A

公开(公告)日：2004-07-29

申请号：JP2002380702

申请日：2002-12-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  YAMAMOTO MASASHI ,  NISHIMURA ISAO

IPC: G03F7/039 ,  C08F20/10 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a (meth)acrylic polymer high in transparency to radiation, excellent in basic properties as a resist such as sensitivity, resolution, dry etching resistance, pattern form, etc. especially excellent in the solubility to a resist solvent, and suitable for a radiation-sensitive resin compound which reduces the roughness on a pattern sidewall after developing. SOLUTION: This (meth)acrylic polymer contains a repeating unit represented by formula (1) wherein R represents hydrogen or a methyl group, X represents a single bond or a 1-3C divalent organic group, Y represents a mutually independent single bond or a 1-3C divalent organic group, and R 1 represents a mutually independent hydrogen atom, a hydroxy group, a cyano group, or a -COOR 3 group. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2011070209A

公开(公告)日：2011-04-07

申请号：JP2010246045

申请日：2010-11-02

Applicant: Internatl Business Mach Corp ,  Jsr Corp ,  Jsr株式会社 ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： NISHIMURA YUKIO ,  YAMAHARA NOBORU ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU ,  ITO HIROSHI

IPC: G03F7/039 ,  C08F214/18 ,  C08F220/22 ,  C08F220/24 ,  C08F232/08 ,  C08G61/08 ,  C08K5/10 ,  C08L27/12 ,  C08L33/06 ,  C08L33/16 ,  C08L35/00 ,  C08L101/08 ,  G03F20060101 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a novel radiation sensitive resin composition having high transparency to radiation, excellent basic physical properties for a resist pattern such as in sensitivity, resolution, and pattern shapes, without causing development defects during fine machining, to manufacture semiconductor elements at a high yield.
SOLUTION: The radiation-sensitive resin compositions comprises (A) a resin containing an acid dissociable group obtained by the open ring polymerization of the norbornene derivative having a structure shown by the following general formula (1), and (B) a radiation-sensitive acid generator. In the general formula (1), R
1 represents a hydrogen atom and a univalent acid dissociation group, X
1 a low-grade fluorinated alkyl group, and R
2 a hydrogen atom, an alkyl group or a fluorinated alkyl group.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种对辐射具有高透明度的新颖的辐射敏感性树脂组合物，用于抗敏剂图案的极好的基本物理性能，例如灵敏度，分辨率和图案形状，而不会在精加工期间引起显影缺陷， 以高产率制造半导体元件。 解决方案：辐射敏感性树脂组合物包含（A）含有通过具有下列通式（1）所示结构的降冰片烯衍生物的开环聚合获得的酸解离基的树脂，（B） 辐射敏感酸发生器。 在通式（1）中，R 1 表示氢原子和一价酸解离基团，低级氟化烷基，X 1， 2个氢原子，烷基或氟化烷基。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2004334156A

公开(公告)日：2004-11-25

申请号：JP2003298079

申请日：2003-08-22

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHIMA MOTOYUKI ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  MATSUDA DAIICHI ,  NAKAMURA ATSUSHI

IPC: G03F7/039 ,  C08F220/18 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to radiation, excellent in sensitivity, resolution, dry etching resistance, pattern profile, etc., and useful as a chemically amplified resist. SOLUTION: The radiation-sensitive resin composition contains (A) an alkali-insoluble or slightly alkali-soluble resin which has at least two repeating units selected from the group of the repeating units represented by formulae (1)-(6) in an amount of 1-49 mol% each and in a total amount of 5-50 mol% and is made readily alkali-soluble by the action of an acid and (B) a radiation-sensitive acid generator. In formulae (1)-(6), R 1 denotes H or methyl; R 2 denotes alkyl which may have a 1-4C substituent. and when a plurality of symbols R 2 are present, they may be the same or different. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供对辐射具有高透明度，优异的灵敏度，分辨率，耐干蚀刻性，图案轮廓等的辐射敏感性树脂组合物，并且可用作化学增幅抗蚀剂。 解决方案：该辐射敏感性树脂组合物含有（A）碱不溶性或微碱溶性树脂，其具有至少两个选自式（1） - （6）所示的重复单元的重复单元， 其量为1-49摩尔％，总量为5-50摩尔％，并且通过酸的作用容易地碱溶解，和（B）辐射敏感性酸产生剂。 式（1） - （6）中，R 1表示H或甲基; R 2表示可以具有1-4C取代基的烷基。 并且当存在多个符号R 2 时，它们可以相同或不同。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003337419A

公开(公告)日：2003-11-28

申请号：JP2003066164

申请日：2003-03-12

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  NISHIMURA ISAO

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation and suitable for use as a chemically amplified resist excellent in basic properties as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin which becomes alkali-soluble by the action of an acid and contains a repeating unit derived from (meth)acrylic esters typified by 1-(2-norbornyl)-1-methylethyl (meth)acrylate and 2-ethyl-2-adamantyl (meth)acrylate and a repeating unit derived from (meth)acrylic esters having a lactone skeleton typified by a compound represented by formula (i) or (ii) (where R is H or methyl) and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供对辐射具有高透明度并且适合用作抗蚀剂基础性能优异的化学放大抗蚀剂的敏感性，分辨率，耐干蚀刻性和图案的辐射敏感性树脂组合物 形状。 解决方案：辐射敏感性树脂组合物包含（A）通过酸的作用变成碱溶性的树脂，并含有以1-（2-降冰片基） - （甲基）丙烯酸为代表的（甲基）丙烯酸酯衍生的重复单元， （甲基）丙烯酸1-甲基乙酯和（甲基）丙烯酸2-乙基-2-金刚烷基酯和由具有以式（i）或（ii）表示的化合物为代表的内酯骨架的（甲基）丙烯酸酯衍生的重复单元（其中 R是H或甲基）和（B）辐射敏感酸产生剂。 版权所有（C）2004，JPO

公开(公告)号：JP2009235185A

公开(公告)日：2009-10-15

申请号：JP2008081060

申请日：2008-03-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： UKO TOMOHIRO ,  NAKAJIMA HIROMITSU ,  SUGIURA MAKOTO ,  OGATA YOICHI ,  YAMAMOTO MASASHI

IPC: C08F6/06

Abstract: PROBLEM TO BE SOLVED: To provide a refining method of a polymer for removing a low solubility component that causes development defects, and to provide a polymer solution obtained by the refining method.
SOLUTION: The refining method includes: a first step of dissolving a polymer insoluble in an alkali or hardly soluble with in alkali and converted into alkali-soluble by an action of an acid, into a good solvent that dissolves the polymer to obtain a polymer solution; a second step of adding a poor solvent that does not dissolve the polymer but is compatible with the good solvent, to the polymer solution in a range not to induce sedimentation by the polymer; and a third step of filtering the polymer solution after the second step. The poor solvent is added in an amount not more than 100 parts by mass with respect to 100 parts by mass of the good solvent, and the filter used for filtration has a pore diameter of not more than 1.0 μm.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于除去导致显影缺陷的低溶解度成分的聚合物的精制方法，并提供通过精制方法获得的聚合物溶液。 解决方案：精炼方法包括：将不溶于碱的聚合物或难溶于碱并通过酸的作用转化为碱溶性的聚合物的第一步骤溶解于溶解聚合物的良溶剂中获得 聚合物溶液; 在不引起聚合物沉淀的范围内，向聚合物溶液中添加不溶解聚合物但与良溶剂相溶的不良溶剂的第二工序; 以及在第二步骤之后过滤聚合物溶液的第三步骤。 相对于100质量份良溶剂，不良溶剂的添加量不超过100质量份，用于过滤的过滤器的孔径不大于1.0μm。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2004203898A

公开(公告)日：2004-07-22

申请号：JP2002330869

申请日：2002-11-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YAMAMOTO MASASHI ,  NAKAMURA ATSUSHI ,  FUJIWARA KOICHI ,  NISHIMURA YUKIO

IPC: G03F7/039 ,  C08F220/16 ,  C08F220/28 ,  C08F220/68 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an acrylic polymer which is suitable for a radiation-sensitive resin composition which has high transparency to radiation and excels in the basic properties (e.g. sensitivity, resolution, dry etching resistance, and pattern shape) as a resist and particularly excels in contact hole formation.
SOLUTION: The acrylic polymer contains repeating units represented by formula (5-1), repeating units represented by (5-2), and repeating units represented by formula (5-3).
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2003322963A

公开(公告)日：2003-11-14

申请号：JP2002128810

申请日：2002-04-30

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SANO KIMIYASU ,  NISHIMURA YUKIO ,  YAMAMOTO MASASHI ,  ISHII HIROYUKI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition useful as a chemically amplified resist excellent in basic physical properties as a resist as well as in exposure window.
SOLUTION: The radiation sensitive resin composition comprises (A) an alkali-insoluble or hardly alkali-soluble acid-dissociating group-containing resin which becomes alkali-soluble by dissociation of the acid-dissociating group, (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation of ≤220 nm wavelength and (C) a phenolic compound represented by formula (C-1).
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供可用作抗蚀剂以及曝光窗的基本物理性能优异的化学放大抗蚀剂的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）通过酸解离基团的解离而变成碱溶性的碱不溶性或几乎不溶于碱的含酸解离基团的树脂，（B） 用光化辐射或≤220nm波长的辐射照射时产生酸，（C）由式（C-1）表示的酚类化合物。 版权所有（C）2004，JPO