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公开(公告)号：MY156416A
公开(公告)日：2016-02-26
申请号：MYPI20101040
申请日：2008-09-05
Applicant: KAO CORP
Inventor： TAMURA ATSUSHI , MIYAMOTO SADAHARU , HORIO YASUNORI
Abstract: AN ALKALI-TYPE NONIONIC SURFACTANT COMPOSITION CONTAINS A NONIONIC SURFACTANT (COMPONENT A), WATER (COMPONENT B), AT LEAST ONE COMPOUND (COMPONENT C) SELECTED FROM THE GROUP CONSISTING OF BENZENESULFONIC ACID, TOLUENESULFONIC ACID, DIMETHYLBENZENESULFONIC ACID, HYDROXYBENZENESULFONIC ACID AND SALTS THEREOF, AND AT LEAST ONE ALKALINE CHEMICAL (COMPONENT D) SELECTED FROM THE GROUP CONSISTING OF POTASSIUM HYDROXIDE AND SODIUM HYDROXIDE. THE ALKALI-TYPE NONIONIC SURFACTANT COMPOSITION CONTAINS THE NONIONIC SURFACTANT (COMPONENT A) IN AN AMOUNT OF 0.5 TO 20 WT% AND HAS A pH AT 25°C OF 12 OR GREATER.
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公开(公告)号：FR2876114A1
公开(公告)日：2006-04-07
申请号：FR0510084
申请日：2005-10-03
Applicant: KAO CORP
Inventor： KONDO JUNJI , HORIO YASUNORI
Abstract: La présente invention concerne une composition de détergent contenant (a) de 2 à 30 % en poids d'un alcali inorganique, (b) de 0,5 à 20 % en poids d'au moins un tensioactif choisi dans le groupe constitué d'un tensioactif anionique et d'un tensioactif non ionique, (c) de 0,01 à 2 % en poids (sur la base de l'ion calcium) d'un sel de calcium, (d) de 0,1 à 15 % en poids d'un agent chélateur des ions calcium, (e) de 1 à 30 % en poids d'un solvant organique hydrosoluble, et (f) de 20 à 95 % en poids d'eau.
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公开(公告)号：JPS62241973A
公开(公告)日：1987-10-22
申请号：JP8573586
申请日：1986-04-14
Applicant: KAO CORP
Inventor： SAKAI TAKEYA , TSUJI AKITOSHI , HORIO YASUNORI
IPC: C09D5/00 , C09D201/00
Abstract: PURPOSE:To obtain a surface covering material which has excellent penetrating properties, adhesiveness, and film-forming properties and is suitable for applying to the surface of a water-absorptive base material, by using an aqueous self- dispersible resin dispersion prepared by finely dividing a polymer by phase conversion method. CONSTITUTION:A polymer solution is obtained by solution polymerization of 2-25wt% monomer (A) having salt-forming groups and polymerizable double bonds (e.g., styrenesulfonate) and 98-75wt% monomer (B) having double bonds copolymerizable therewith [e.g., methyl (meth)acrylate] in a hydrophilic organic solvent (C) (e.g., methyl ethyl ketone). If necessary, a neutralizing agent is added to this solution to ionize the salt-forming groups, and water is added thereto to distil off component C, thus giving an aqueous dispersion of a self-dispersible resin having a number-average molecular weight of 2,000-200,000 and an average particle diameter of 0.001-0.2mum, preferably 0.001-0.05mum. A surface covering material containing this dispersion is applied to the surface of a water- absorptive base material (e.g., concrete).
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公开(公告)号：JP2010170615A
公开(公告)日：2010-08-05
申请号：JP2009012222
申请日：2009-01-22
Inventor： MIYAMOTO SADAJI , HASHIMOTO RYOICHI , TAMURA ATSUSHI , HORIO YASUNORI
Abstract: PROBLEM TO BE SOLVED: To provide a detergent composition for an HD (hard disk) substrate which exhibits excellent detergency and anti-foaming property with less COD, and to provide a method of manufacturing the HD substrate using the detergent composition.
SOLUTION: The detergent composition for the HD substrate including an Ni-P content layer includes: polyacrylic acid alkali metal salt whose weight average molecular weight is 1,000-10,000 (component (a)); p-toluenesulfonic acid alkali metal salt (component (b)); water-soluble amine compound (component (c)); chelating agent (component (d)); and water (component (e)), and does not substantially includes nonionic surfactant. Within the total amount of the components (a), (b), (c) and (d), the detergent composition includes; 5-35 wt.% of the component (a); 15-50 wt.% of the component (b); 15-50 wt.% of the component (c); and 5-25 wt.% of the component (d), and a weight ratio of the component (c) and component (d) {component (c)/component (d)} is 0.8-5.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：提供一种HD（硬盘）基材的洗涤剂组合物，其具有优异的去污力和较少COD的消泡性能，并提供使用洗涤剂组合物制造HD基材的方法。 解决方案：包含Ni-P含量层的HD基材用洗涤剂组合物包括：重均分子量为1,000〜10,000的聚丙烯酸碱金属盐（成分（a））; 对甲苯磺酸碱金属盐（组分（b））; 水溶性胺化合物（成分（c））; 螯合剂（组分（d））; 和水（组分（e）），并且基本上不包括非离子表面活性剂。 在组分（a），（b），（c）和（d）的总量中，洗涤剂组合物包括： 5-35重量％的组分（a）; 15-50重量％的组分（b）; 15-50重量％的组分（c）; 和组分（d）的5-25重量％，组分（c）和组分（d）组分（c）/组分（d）}的重量比为0.8-5。 版权所有（C）2010，JPO＆INPIT
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5.发明专利Aqueous cleaning agent composition for substrate for perpendicular magnetic recording hard disk 有权用于磁性记录硬盘的基板的清洁剂清洁剂组合物
公开(公告)号：JP2009087521A
公开(公告)日：2009-04-23
申请号：JP2008228761
申请日：2008-09-05
Inventor： MIYAMOTO SADAJI , TAMURA ATSUSHI , HORIO YASUNORI
Abstract: PROBLEM TO BE SOLVED: To provide an aqueous cleaning agent composition for substrates for perpendicular magnetic recording hard disk having a high cleaning capability, a cleaning method performed by using the same, and a method for manufacturing a perpendicular magnetic recording hard disk. SOLUTION: The aqueous cleaning agent composition for substrates for perpendicular magnetic recording hard disk having an Ni-P-containing layer contains one surfactant or more selected from the group consisting of surfactants represented by formulae (1) and (2)-(6)(unillustrated), and having a pH of not more than 5 at 25°C. In formula (1), R 1 represents an alkyl group having 10-16 carbon atoms, and X represents a halogen atom. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 解决的问题：提供一种具有高清洁能力的垂直磁记录硬盘用基板的水性清洗剂组合物，使用该清洗能力的清洗方法及垂直磁记录硬盘的制造方法。 解决方案：具有含Ni-P层的垂直磁记录硬盘用基材用水性清洗剂组合物含有选自由式（1）和（2）表示的表面活性剂 - （ 6）（未示出），在25℃下的pH值不大于5。 在式（1）中，R SP 1表示具有10-16个碳原子的烷基，X表示卤素原子。 版权所有（C）2009，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JPH11181494A
公开(公告)日：1999-07-06
申请号：JP35811797
申请日：1997-12-25
Applicant: KAO CORP
Inventor： KITAZAWA KOZO , HORIO YASUNORI
Abstract: PROBLEM TO BE SOLVED: To obtain a detergent composition having excellent cleanability of a semiconductor substrate or a semiconductor element stuck with solid fine particles and oily stain and slight in foaming properties and to provide a method for cleaning, having excellent cleanability of a semiconductor substrate or a semiconductor element stuck with solid fine particles and oily stain and slight in foaming properties. SOLUTION: This detergent composition for a semiconductor substrate or a semiconductor element contains a polycarboxylic acid compound comprising at least one selected from the group consisting of acrylic acid, methacrylic acid and maleic acid as a monomer component, obtained by using >=20 mol.% of the monomer component based on the whole monomer components and having 500-150,000 weight-average molecular weight. The method for cleaning a semiconductor substrate or a semiconductor element comprises cleaning by using this detergent composition.
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公开(公告)号：JPS62241901A
公开(公告)日：1987-10-22
申请号：JP8573086
申请日：1986-04-14
Applicant: KAO CORP
Inventor： SAKAI TAKEYA , HORIO YASUNORI
Abstract: PURPOSE:To obtain a self-dispersed water-based resin which is uniform and stable and has a small particle diameter, by forming a polymer solution from an monomer having a salt-forming group and a polymerizable double bond, a copolymerizable monomer having a polymerizable double bond and a hydrophilic organic solvent and converting this polymer solution into a water- based dispersion. CONSTITUTION:A polymer solution is obtained by solution-polymerizing 2-25wt% monomer having a salt-forming group and a polymerizable double bond with 98-75wt% copolymerizable monomer having a polymerizable double bond in a hydrophilic organic solvent or by bulk-polymerizing said monomers and dissolving the bulk-polymerized polymer in a hydrophilic organic solvent. This polymer solution is converted into a water-based dispersion by ionizing the salt-forming groups by the addition of, if necessary, a neutralizing agent, adding water to the solution and removing the hydrophilic organic solvent. As said organic solvent, at least one of the alcohol, ketone, ester and ether solvents is desirably used.
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公开(公告)号：JP2010086563A
公开(公告)日：2010-04-15
申请号：JP2008251309
申请日：2008-09-29
Inventor： TAMURA ATSUSHI , MIYAMOTO SADAJI , HASHIMOTO RYOICHI , HORIO YASUNORI
Abstract: PROBLEM TO BE SOLVED: To provide a detergent composition for a glass substrate used for a hard disk with which a glass surface cleaned in a high degree is obtained, to provide a method for cleaning the glass surface by using the detergent, and to provide a method for manufacturing the hard disk.
SOLUTION: The detergent composition for the glass substrate used for the hard disk contains an alkali agent (component A), aldonic acids (component B), and water, and is ≥pH10. The aldonic acid is preferably gluconic acid and/or its salt. Furthermore, the detergent composition preferably includes one or more compounds (component C) selected from a group including, benzene sulfonic acid, toluene sulfonic acid, dimethylbenzene sulfonic acid, hydroxybenzene sulfonic acid, and their salts.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：提供一种用于玻璃基板的洗涤剂组合物，该组合物用于获得高度清洁玻璃表面的硬盘，以提供使用洗涤剂来清洁玻璃表面的方法，以及 以提供制造硬盘的方法。 解决方案：用于硬盘的玻璃基板用洗涤剂组合物含有碱剂（A成分），醛糖酸（B成分）和水，≥pH10。 醛糖酸优选是葡萄糖酸和/或其盐。 此外，洗涤剂组合物优选包含一种或多种选自苯磺酸，甲苯磺酸，二甲苯磺酸，羟基苯磺酸及其盐的化合物（组分C）。 版权所有（C）2010，JPO＆INPIT
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公开(公告)号：JPH11121418A
公开(公告)日：1999-04-30
申请号：JP28031797
申请日：1997-10-14
Applicant: KAO CORP
Inventor： KITAZAWA KOZO , HORIO YASUNORI
IPC: C11D1/72 , C11D1/722 , C11D3/20 , H01L21/304 , H05K3/26
Abstract: PROBLEM TO BE SOLVED: To improve removing and cleaning performance of solid particulates, by containing a compound expressed by a specific constitutional formula. SOLUTION: In a cleaning agent composition, a compound expressed by a formula I and/or a compound expressed by R -O-(AO)m -X is contained. In the formula, R is a hydrogen atom, an alkyl group having 1-5 carbon atoms or an alkenyl group having 2-5 carbon atoms; AO is ethylene oxide and/or propylene oxide; X is hydrogen atom, alkyl group having 1-4 carbon atoms or acryl group having 1-4 carbon atoms; (n) is an integer of 0-2; (m) is an integer of 1-8; R2 , is alkyl group having 1-6 carbon atoms, alkenyl group having 2-6 carbon atoms or acyl group having 1-6 carbon atoms. Cleaning performance is improved and bubbles are reduced by using the cleaning agent component containing the compound.
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公开(公告)号：JPH11116984A
公开(公告)日：1999-04-27
申请号：JP28855397
申请日：1997-10-21
Applicant: KAO CORP
Inventor： KITAZAWA KOZO , HORIO YASUNORI
Abstract: PROBLEM TO BE SOLVED: To obtain a detergent compsn. which has a high capability of cleaning semiconductor substrates or semiconductor devices with solid particulates or greasy stains and soils deposited thereon and causes no significant foaming by incorporating a compd. having in its molecule two or more sulfonic acid groups. SOLUTION: This detergent compsn. for semiconductor substrates or semiconductor devices contains a compd. (A) having in its molecule two or more sulfonic acid groups. Pref., the detergent compsn. further contains a compd. (B) represented by formula I (wherein R represents H, a 1-5C alkyl group, or a 2-5C alkenyl group; AO represents ethylene oxide and/or propylene oxide; X represents H, a 1-4C alkyl group, or a 1-4C acyl group; (n) is 0 to 2; and (m) is 1 to 8), at least one compd. (C) selected from compds. represented by formula II (wherein R represents a 1-6C alkyl group, a 2-6C alkenyl group, or a 1-6C acyl group; and AO, X, and (m) are each as defined in formula I), and a nonionic surfactant (D). Cleaning with this compsn. is carried out in a concn. of 0.001 to 20 wt.% in terms of the total content of the components A, B, C, and D.
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