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    A TRI-AXIS ACCELEROMETER
    1.
    发明申请
    A TRI-AXIS ACCELEROMETER 审中-公开

    公开(公告)号：WO2007061756A3

    公开(公告)日：2007-05-31

    申请号：PCT/US2006/044517

    申请日：2006-11-16

    Applicant: KIONIX, INC. ,  ADAMS, Scott G. ,  MILLER, Scott A. ,  SHEN-EPSTEIN, June ,  EPSTEIN, Keith

    Inventor： ADAMS, Scott G. ,  MILLER, Scott A. ,  SHEN-EPSTEIN, June ,  EPSTEIN, Keith

    IPC: G01P15/00

    Abstract: In an embodiment of the present invention there is provided a micro-electromechanical (MEMS) accelerometer, including a substrate, a first sensor and a second sensor. The first sensor is configured to measure an acceleration along a first axis parallel to a plane of the substrate. The second sensor is configured to measure an acceleration along an axis perpendicular to the plane of the substrate. The second sensor comprises a first beam, a second beam and a single support structure. The single support structure supports the first and second beams relative to the substrate, wherein the first and second beams circumscribe the first sensor.

    A TRI-AXIS ACCELEROMETER
    2.
    发明公开
    A TRI-AXIS ACCELEROMETER 有权
    三轴加速度计

    公开(公告)号：EP1952165A2

    公开(公告)日：2008-08-06

    申请号：EP06837791.0

    申请日：2006-11-16

    Applicant: KIONIX, INC.

    Inventor： ADAMS, Scott G. ,  MILLER, Scott A. ,  SHEN-EPSTEIN, June ,  EPSTEIN, Keith

    IPC: G01P15/18 ,  G01P15/125 ,  H01L21/00

    CPC classification number: G01P15/125 ,  G01P15/0802 ,  G01P15/18 ,  G01P2015/0828

    Abstract: In an embodiment of the present invention there is provided a micro-electromechanical (MEMS) accelerometer, including a substrate, a first sensor and a second sensor. The first sensor is configured to measure an acceleration along a first axis parallel to a plane of the substrate. The second sensor is configured to measure an acceleration along an axis perpendicular to the plane of the substrate. The second sensor comprises a first beam, a second beam and a single support structure. The single support structure supports the first and second beams relative to the substrate, wherein the first and second beams circumscribe the first sensor.

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