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    DETERMINING CRITICAL PARAMETERS USING A HIGH-DIMENSIONAL VARIABLE SELECTION MODEL
    1.
    发明专利
    DETERMINING CRITICAL PARAMETERS USING A HIGH-DIMENSIONAL VARIABLE SELECTION MODEL 未知

    公开(公告)号：SG11201704383QA

    公开(公告)日：2017-06-29

    申请号：SG11201704383Q

    申请日：2015-12-02

    Applicant: KLA TENCOR CORP

    Inventor： CHANG WEI ,  GUTIERREZ JOSEPH ,  RAO KRISHNA

    IPC: H01L21/66

    Abstract: A high-dimensional variable selection unit determines a list of critical parameters from sensor data and parametric tool measurements from a semiconductor manufacturing tool, such as a semiconductor inspection tool or other types of semiconductor manufacturing tools. The high-dimensional variable selection model can be, for example, elastic net, forward-stagewise regression, or least angle regression. The list of critical parameters may be used to design a next generation semiconductor manufacturing tool, to bring the semiconductor manufacturing tool back to a normal status, to match a semiconductor manufacturing tool's results with that of another semiconductor manufacturing tool, or to develop a specification for the semiconductor manufacturing tool.

    DETERMINING CRITICAL PARAMETERS USING A HIGH-DIMENSIONAL VARIABLE SELECTION MODEL
    2.
    发明专利
    DETERMINING CRITICAL PARAMETERS USING A HIGH-DIMENSIONAL VARIABLE SELECTION MODEL 未知

    公开(公告)号：SG10201912731QA

    公开(公告)日：2020-02-27

    申请号：SG10201912731Q

    申请日：2015-12-02

    Applicant: KLA TENCOR CORP

    Inventor： CHANG WEI ,  GUTIERREZ JOSEPH ,  RAO KRISHNA

    Abstract: A high-dimensional variable selection unit determines a list of critical parameters from sensor data and parametric tool measurements from a semiconductor manufacturing tool, such as a semiconductor inspection tool or other types of semiconductor manufacturing tools. The high-dimensional variable selection model can be, for example, elastic net, forward-stagewise regression, or least angle regression. The list of critical parameters may be used to design a next generation semiconductor manufacturing tool, to bring the semiconductor manufacturing tool back to a normal status, to match a semiconductor manufacturing tool's results with that of another semiconductor manufacturing tool, or to develop a specification for the semiconductor manufacturing tool.

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