公开(公告)号：JP2011154039A

公开(公告)日：2011-08-11

申请号：JP2011083897

申请日：2011-04-05

Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

Inventor： STOKOWSKI STAN ,  SAIDIN ZAIN K

IPC: G01N21/956

CPC classification number: G01M11/0264 ,  G01N21/95607

Abstract: PROBLEM TO BE SOLVED: To provide a method for altering the phase and/or amplitude of an optical beam within an inspection system using one or more spatial light modulators (SLMs). SOLUTION: An apparatus 100 for optically inspecting a sample includes a beam generator 102 for directing an incident optical beam 115 onto a sample 116. An output beam 125 is directed from the sample toward a detector 126 via an optical image forming systems 120 and 124. The apparatus further includes a programmable spatial light modulator (SLM) positioned within an optical path of either the output beam or the incident beam. The SLM includes a first SLM along with an irradiation aperture 108 and a second SLM along with a field aperture 112, and is configured to adjust a phase or amplitude profile of the incident beam or the output beam. The SLM is configured to alter an illumination profile of the incident beam to achieve different inspection modes. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于使用一个或多个空间光调制器（SLM）来改变检查系统内的光束的相位和/或幅度的方法。 解决方案：用于光学检查样本的装置100包括用于将入射光束115引导到样本116上的光束发生器102.输出光束125经由光学成像系统120从样本指向检测器126 该装置还包括位于输出光束或入射光束的光路内的可编程空间光调制器（SLM）。 SLM包括第一SLM以及照射孔108和第二SLM以及场孔112，并且被配置为调整入射光束或输出光束的相位或幅度分布。 SLM被配置为改变入射光束的照明轮廓以实现不同的检查模式。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：WO03058681A3

公开(公告)日：2003-08-28

申请号：PCT/US0241364

申请日：2002-12-24

Applicant: KLA TENCOR CORP

Inventor： KRANTZ MATTHIAS C ,  PETTIBONE DONALD W ,  KVAMME DAMON F ,  STOKOWSKI STAN

IPC: G01N21/896 ,  G01N21/956 ,  G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  G01B9/02

CPC classification number: G01N21/95607 ,  G01N2021/95676 ,  G03F1/84

Abstract: Provided are apparatus and methods for detecting phase defects. The invention relies generally on the distortion of light as it passes through defects in phase shift masks (310) to detect these defects. Light traveling through a defect, such as a bump in an etched area will travel at a different rate than light traveling through air. In order to enhance the signals generated from the defects, the invention in several embodiments provides a defocused light beam (302) by setting the focus of the beam to a level above or below the photomask subject to inspection. The light from the photomask is collected by a detector (314) that is split into at least two portions, each generating a signal. A resulting differential signal produced from the signals generated at each of two detector portions is used to determine whether a defect in the photomask is present, in one embodiment, by generating an image from the resulting signal.

Abstract translation: 提供了用于检测相位缺陷的装置和方法。 本发明通常依赖于当光通过相移掩模（310）中的缺陷以检测这些缺陷时的光的失真。 穿过缺陷的光，例如蚀刻区域中的凸起，将以与通过空气传播的光不同的速度行进。 为了增强从缺陷产生的信号，本发明在几个实施例中通过将光束的焦点设置在待检查的光掩模上方或下方的水平来提供散焦光束（302）。 来自光掩模的光由检测器（314）收集，检测器（314）被分成至少两部分，每个产生一个信号。 在一个实施例中，由在两个检测器部分中的每一个产生的信号产生的所得到的差分信号用于确定光掩模中的缺陷是否通过从所得到的信号产生图像。