公开(公告)号：WO02091026A3

公开(公告)日：2003-04-03

申请号：PCT/US0214173

申请日：2002-05-02

Applicant: KLA TENCOR CORP

Inventor： KRANTZ MATTHIAS C ,  WIHL MARK JOSEPH ,  STOKOWSKI STANLEY E

IPC: G01N21/956 ,  G03F1/26 ,  G03F1/84 ,  G01N21/88

CPC classification number: G03F1/84 ,  G01N21/95607 ,  G03F1/26

Abstract: Inspection of photomasks for defects in phase-shifters is enhanced using optical techniques based on multiple modified radiation collection techniques, which allows allow for errors in phase-shifters to be more accurately detected. The system includes an illumination system (105), at least on collection system (107R, 107T), and a data analysis section (108). In one embodiment, the intensities of two slightly defocused images of phase objects corresponding to the same photomask location are compared. In a second embodiment, radiation having two Zernike point spread functions is used to obtain two slightly different phase sensitive images. Data collected and analyzed by the data analysis section (108) using this method provides much greater sensitivity to phase objects and errors in phase objects than prior art inspection systems. Embodiments include both scanning-type and projector type optical architectures and may utilize radiation transmitted or reflected by a sample.

Abstract translation: 使用基于多个改进的辐射采集技术的光学技术来增强对移相器中的缺陷的光掩模的检查，这允许更精确地检测移相器中的错误。 该系统包括至少在收集系统（107R，107T）和数据分析部分（108）上的照明系统（105）。 在一个实施例中，比较对应于相同光掩模位置的相位物体的两个稍微散焦的图像的强度。 在第二实施例中，使用具有两个泽尼克点扩散函数的辐射来获得两个稍微不同的相位敏感图像。 使用这种方法由数据分析部分（108）收集和分析的数据比现有技术的检查系统对相位对象和相位对象的误差提供了更大的灵敏度。 实施例包括扫描型和投影仪型光学架构，并且可以利用由样本传输或反射的辐射。