公开(公告)号：WO2013158561A1

公开(公告)日：2013-10-24

申请号：PCT/US2013/036635

申请日：2013-04-15

Applicant: KLA-TENCOR CORPORATION

Inventor： SUBRAHMANYAN, Pradeep ,  WACK, Daniel ,  WRIGHT, Michael ,  ALLES, David

IPC: H01L21/68 ,  H01L21/66 ,  H01L21/638

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.

Abstract translation: 一种用于在半导体检测工具中使样本台运动与时间延迟积分（TDI）电荷耦合器件（CCD）同步的方法，包括：测量保持被检样品的台的横向位置; 测量舞台的垂直位置; 基于所测量的横向和垂直位置确定样本的成像像素的校正横向位置; 以及使所述TDI CCD的电荷转移与被成像像素的校正横向位置同步。

公开(公告)号：WO2014172476A1

公开(公告)日：2014-10-23

申请号：PCT/US2014/034395

申请日：2014-04-16

Applicant: KLA-TENCOR CORPORATION

Inventor： STANKE, Fred ,  TOYTMAN, Ilya ,  ALLES, David ,  INDERHEES, Gregg ,  STOKOWSKI, Stanley ,  VAEZ-IRAVANI, Mehdi

IPC: H01L21/66 ,  H01L21/027

CPC classification number: G06T7/001 ,  G01N21/956 ,  G01N2021/95676 ,  G06K9/00 ,  G06T2207/10056 ,  G06T2207/30148

Abstract: Optical inspection methods and apparatus for high-resolution photomasks using only a test image. A filter is applied to an image signal received from radiation that is transmitted by or reflected from a photomask having a test image. The filter may be implemented using programmed control to adjust and control filter conditions, illumination conditions, and magnification conditions.

Abstract translation: 仅使用测试图像的高分辨率光掩模的光学检测方法和设备。 将滤波器应用于从具有测试图像的光掩模透射或反射的辐射接收的图像信号。 滤波器可以使用编程控制来实现，以调节和控制滤波器条件，照明条件和放大条件。

公开(公告)号：WO2014124158A2

公开(公告)日：2014-08-14

申请号：PCT/US2014/015135

申请日：2014-02-06

Applicant: KLA-TENCOR CORPORATION

Inventor： WANG, Daimian ,  WANG, Li ,  ALLES, David

CPC classification number: G03F1/24 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/22 ,  G03F1/84 ,  G03F7/70033

Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.

Abstract translation: 一种极光紫外线（EUM）掩模检查系统，包括沿着光轴投射EUV光的光源，用于接收来自源的EUV光的照明系统，该照明系统包括光谱纯度滤光片（SPF），SPF透射 所述EUV光的第一部分沿光轴朝向掩模，并且所述SPF包括多个至少部分反射元件，所述元件将所述EUV光的第二部分反射离开所述光轴，所述投影系统适于接收所述第一 所述EUV光在其照亮所述掩模之后的部分，适于接收所述图像的第一检测器阵列，以及用于接收所述EUV光的第二部分的第二检测器阵列。 SPF可以包括一个或多个多层干涉型滤波器。 或者，SPF包括设置在掠入射镜阵列上的薄膜滤光器。

公开(公告)号：WO2008137920A1

公开(公告)日：2008-11-13

申请号：PCT/US2008/062873

申请日：2008-05-07

Applicant: KLA-TENCOR CORPORATION ,  ALLES, David ,  WIHL, Mark ,  STOKOWSKI, Stan ,  XIONG, Yalin ,  KVAMME, Damon

Inventor： ALLES, David ,  WIHL, Mark ,  STOKOWSKI, Stan ,  XIONG, Yalin ,  KVAMME, Damon

IPC: G03F1/00

CPC classification number: G03F1/84

Abstract: Methods for detecting and classifying defects on a reticle are provided. One method includes acquiring images of the reticle at first and second conditions during inspection of the reticle. The first condition is different than the second condition. The method also includes detecting the defects on the reticle using one or more of the images acquired at the first condition. In addition, the method includes classifying an importance of the defects detected on the reticle using one or more of the images acquired at the second condition. The detecting and classifying steps are performed substantially simultaneously during the inspection.

Abstract translation: 提供了在掩模版上检测和分类缺陷的方法。 一种方法包括在检查光罩期间在第一和第二条件下获取掩模版的图像。 第一个条件不同于第二个条件。 该方法还包括使用在第一条件下获取的一个或多个图像检测掩模版上的缺陷。 此外，该方法包括使用在第二条件下获取的一个或多个图像来分类在掩模版上检测到的缺陷的重要性。 在检查期间基本上同时执行检测和分类步骤。

公开(公告)号：EP2839505A1

公开(公告)日：2015-02-25

申请号：EP13777897.3

申请日：2013-04-15

Applicant: Kla-Tencor Corporation

Inventor： SUBRAHMANYAN, Pradeep ,  WACK, Daniel ,  WRIGHT, Michael ,  ALLES, David

IPC: H01L21/68 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel.

Abstract translation: 一种用于在半导体检验工具中使采样台运动与时间延迟积分（TDI）电荷耦合器件（CCD）同步的方法，包括：测量保持被检样品的台的横向位置; 测量舞台的垂直位置; 基于所测量的横向和竖直位置来确定样本的成像像素的校正的横向位置; 并使TDI CCD的电荷转移与成像像素的校正横向位置同步。

公开(公告)号：EP2839505B1

公开(公告)日：2019-08-14

申请号：EP13777897.3

申请日：2013-04-15

Applicant: Kla-Tencor Corporation

Inventor： SUBRAHMANYAN, Pradeep ,  WACK, Daniel ,  WRIGHT, Michael ,  ALLES, David

IPC: H01L21/68 ,  H01L21/66

公开(公告)号：EP2954374A2

公开(公告)日：2015-12-16

申请号：EP14748855.5

申请日：2014-02-06

Applicant: Kla-Tencor Corporation

Inventor： WANG, Daimian ,  WANG, Li ,  ALLES, David

IPC: G03F1/84 ,  G03F7/00 ,  H01L21/027

CPC classification number: G03F1/24 ,  G01N21/956 ,  G01N2021/95676 ,  G03F1/22 ,  G03F1/84 ,  G03F7/70033

Abstract: An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array.