公开(公告)号：WO2017147261A1

公开(公告)日：2017-08-31

申请号：PCT/US2017/019077

申请日：2017-02-23

Applicant: KLA-TENCOR CORPORATION

Inventor： BRINGOLTZ, Barak ,  GUREVICH, Evgeni ,  ADAM, Ido ,  FELER, Yoel ,  ALUMOT, Dror ,  LAMHOT, Yuval ,  SELLA, Noga ,  DELEEUW, Yaron ,  YAZIV, Tal ,  ASHWAL, Eltsafon ,  SALTOUN, Lilach ,  LEVIANT, Tom

IPC: H01L21/66

CPC classification number: H01L22/20 ,  G03F7/70633 ,  G03F9/7003 ,  G06F17/30598 ,  H01L22/12

Abstract: Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.

Abstract translation: 提供了方法，计量模块和目标设计，这提高了计量测量的准确性。 方法提供了多种测量配方和设置的灵活处理，并能够将它们与景观特征相关联，这些特征指示它们与共振区域和平坦区域的关系。 分开或组合使用配方集群，自我一致性测试，聚合测量的共同处理，降噪，聚类分析，景观和具有倾斜单元的目标的详细分析，以提供测量准确度的累积改进。

公开(公告)号：WO2016086056A1

公开(公告)日：2016-06-02

申请号：PCT/US2015/062523

申请日：2015-11-24

Applicant: KLA-TENCOR CORPORATION

Inventor： MARCIANO, Tal ,  BRINGOLTZ, Barak ,  GUREVICH, Evgeni ,  ADAM, Ido ,  LINDENFELD, Za'ev ,  ZHAO, Zeng ,  FELER, Yoel ,  KANDEL, Daniel ,  CARMEL, Nadav ,  MANASSEN, Amnon ,  AMIR, Nuriel ,  KAMINSKY, Oded ,  YAZIV, Tal ,  ZAHARAN, Ofer ,  COOPER, Moshe ,  SULIMARSKI, Roee ,  LEVIANT, Tom ,  SELLA, Noga ,  EFRATY, Boris ,  SALTOUN, Lilach ,  HANDELMAN, Amir ,  ASHWAL, Eltsafon ,  BACHAR, Ohad

IPC: H01L21/66

CPC classification number: G03F9/7003 ,  G03F7/70633 ,  H01L22/12 ,  H01L22/20

Abstract: Methods are provided of deriving a partially continuous dependency of metrology metric(s) on recipe parameter(s), analyzing the derived dependency, determining a metrology recipe according to the analysis, and conducting metrology measurement(s) according to the determined recipe. The dependency may be analyzed in form of a landscape such as a sensitivity landscape in which regions of low sensitivity and/or points or contours of low or zero inaccuracy are detected, analytically, numerically or experimentally, and used to configure parameters of measurement, hardware and targets to achieve high measurement accuracy. Process variation is analyzed in terms of its effects on the sensitivity landscape, and these effects are used to characterize the process variation further, to optimize the measurements and make the metrology both more robust to inaccuracy sources and more flexible with respect to different targets on the wafer and available measurement conditions.

Abstract translation: 提供了一种方法，用于导出计量度量对配方参数的部分连续依赖性，分析衍生依赖性，根据分析确定计量配方，并根据确定的配方进行计量测量。 依赖性可以以景观的形式进行分析，例如灵敏度景观，其中检测到低分辨率或零误差的低灵敏度和/或点或等值线的区域，分析，数字或实验，并用于配置测量参数，硬件 并达到高测量精度。 根据其对灵敏度景观的影响分析过程变化，并且这些效应用于进一步表征过程变化，优化测量结果，使计量学对于不准确性来源更加鲁棒，并且对于不同的目标更灵活 晶圆和可用的测量条件。

公开(公告)号：EP3420581A1

公开(公告)日：2019-01-02

申请号：EP17757185.8

申请日：2017-02-23

Applicant: Kla-Tencor Corporation

Inventor： BRINGOLTZ, Barak ,  GUREVICH, Evgeni ,  ADAM, Ido ,  FELER, Yoel ,  ALUMOT, Dror ,  LAMHOT, Yuval ,  SELLA, Noga ,  DELEEUW, Yaron ,  YAZIV, Tal ,  ASHWAL, Eltsafon ,  SALTOUN, Lilach ,  LEVIANT, Tom

IPC: H01L21/66