公开(公告)号：WO2018118805A1

公开(公告)日：2018-06-28

申请号：PCT/US2017/067092

申请日：2017-12-18

Applicant: KLA-TENCOR CORPORATION

Inventor： CROSS, Andrew ,  PARK, Allen

IPC: H01L21/66 ,  H01L21/027

Abstract: A weak pattern identification method includes acquiring inspection data from a set of patterns on a wafer, identifying failing pattern types on the wafer, and grouping like pattern types of the failing pattern types into a set of pattern groups. The weak pattern identification method also includes acquiring image data from multiple varied instances of a first pattern type grouped in a first group, wherein the multiple varied instances of the first pattern type are formed under different conditions. The weak pattern identification method also includes comparing images obtained from common structures of the instances of the first pattern type to identify local differences within a portion of the first pattern type. Further, the weak pattern identification method includes identifying metrology sites within the portion of the first pattern type proximate to a location of the local differences within the portion of the first pattern type.

公开(公告)号：WO2017180397A3

公开(公告)日：2017-10-19

申请号：PCT/US2017/026207

申请日：2017-04-05

Applicant: KLA-TENCOR CORPORATION

Inventor： SAH, Kaushik ,  CROSS, Andrew

IPC: G03F7/20

Abstract: A design aware system, method, and computer program product are provided for detecting overlay-related defects in multi-patterned fabricated devices. In use, a design of a multi-patterned fabricated device is received by a computer system. Then, the computer system automatically determines from the design one or more areas of the design that are prone to causing overlay errors. Further, an indication of the determined one or more areas is output by the computer system to an inspection system for use in inspecting a multi-patterned device fabricated in accordance with the design.

Abstract translation: 提供了一种设计感知系统，方法和计算机程序产品，用于检测多图案制造器件中的与覆盖相关的缺陷。 在使用中，计算机系统接收多图案制造装置的设计。 然后，计算机系统根据设计从设计中自动确定一个或多个易于导致重叠错误的设计区域。 此外，所确定的一个或多个区域的指示被计算机系统输出到检查系统，用于检查根据设计制造的多图案装置。

公开(公告)号：WO2019046428A1

公开(公告)日：2019-03-07

申请号：PCT/US2018/048546

申请日：2018-08-29

Applicant: KLA-TENCOR CORPORATION

Inventor： PLIHAL, Martin ,  DUFFY, Brian ,  VON DEN HOFF, Mike ,  CROSS, Andrew ,  SAH, Kaushik ,  MANI, Antonio

IPC: H01L21/66

Abstract: Methods and systems for identifying nuisances and defects of interest (DOIs) in defects detected on a wafer are provided. One method includes acquiring metrology data for the wafer generated by a metrology tool that performs measurements on the wafer at an array of measurement points. In one embodiment, the measurement points are determined prior to detecting the defects on the wafer and independently of the defects detected on the wafer. The method also includes determining locations of defects detected on the wafer with respect to locations of the measurement points on the wafer and assigning metrology data to the defects as a defect attribute based on the locations of the defects determined with respect to the locations of the measurement points. In addition, the method includes determining if the defects are nuisances or DOIs based on the defect attributes assigned to the defects.

公开(公告)号：WO2017180397A2

公开(公告)日：2017-10-19

申请号：PCT/US2017/026207

申请日：2017-04-05

Applicant: KLA-TENCOR CORPORATION

Inventor： SAH, Kaushik ,  CROSS, Andrew

IPC: G03F7/20

CPC classification number: G06T7/0004 ,  G06T2207/30148 ,  H01L21/0332 ,  H01L21/0338 ,  H01L22/12 ,  H01L22/20

Abstract: A design aware system, method, and computer program product are provided for detecting overlay-related defects in multi-patterned fabricated devices. In use, a design of a multi-patterned fabricated device is received by a computer system. Then, the computer system automatically determines from the design one or more areas of the design that are prone to causing overlay errors. Further, an indication of the determined one or more areas is output by the computer system to an inspection system for use in inspecting a multi-patterned device fabricated in accordance with the design.