公开(公告)号：WO2012148848A2

公开(公告)日：2012-11-01

申请号：PCT/US2012/034665

申请日：2012-04-23

Applicant: KLA-TENCOR CORPORATION ,  HESS, Carl ,  MILLER, John, D. ,  XUE, Shan ,  LOPRESTI, Patrick

Inventor： HESS, Carl ,  MILLER, John, D. ,  XUE, Shan ,  LOPRESTI, Patrick

IPC: G06T7/40

CPC classification number: G01N21/95607 ,  G01N21/94 ,  G01N2021/95676

Abstract: A semiconductor inspection apparatus performs a hybrid inspection process including cell-to-cell inspection, die-to-die inspection and die-to-golden or die-to- database inspection. The apparatus creates a golden image of a reticle complimentary to portions of the reticle that can be inspected by cell-to-cell inspection or die-to-die inspection. Alternatively, the apparatus creates a reduced database complimentary to portions of the reticle that can be inspected by cell-to- cell inspection or die-to-die inspection.

Abstract translation: 半导体检查装置进行包括电池到电池检查，管芯到管芯检查和金属到金属或管芯到数据库检查的混合检查过程。 该装置产生与通过电池到电池检查或模 - 模检查可以检查的掩模版的部分互补的掩模版的金色图像。 或者，该装置产生与通过电池到电池检查或管芯到管芯检查可以检查的掩模版的部分互补的减少的数据库。

公开(公告)号：WO2015027198A1

公开(公告)日：2015-02-26

申请号：PCT/US2014/052371

申请日：2014-08-22

Applicant: KLA-TENCOR CORPORATION

Inventor： SEZGINER, Abdurrahman ,  LOPRESTI, Patrick ,  BLECHER, Joe ,  SHI, Rui-fang ,  XIONG, Yalin ,  FIELDEN, John

IPC: G06T7/00

CPC classification number: G01N21/8851 ,  G01N21/8806 ,  G01N21/958 ,  G01N2021/8887 ,  G01N2201/125 ,  G06T7/001 ,  G06T2207/20224 ,  G06T2207/30148

Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.

Abstract translation: 块对块掩模版检查包括用掩模版检查子系统获取掩模版的一部分的条带图像，识别样本图像中的块的第一次出现以及条纹图像中的块的至少第二次出现 基本上类似于块的第一次出现并且确定块的位置，一个或多个几何特征和块的第一次出现与块的至少第二次出现之间的空间偏移中的至少一个。