-
公开(公告)号：WO2017087571A1
公开(公告)日：2017-05-26
申请号：PCT/US2016/062355
申请日：2016-11-16
Applicant: KLA-TENCOR CORPORATION
Inventor： MAHER, Christopher , BRAUER, Bjorn , RAMACHANDRAN, Vijay , KARSENTI, Laurent , ROSENGAUS, Eliezer , JORDAN, John , MILLER, Roni
CPC classification number: G06T7/001 , G06K9/6202 , G06K9/6212 , G06K9/74 , G06T7/11 , G06T2207/20182 , G06T2207/30148
Abstract: A defect detection method includes acquiring a reference image; selecting a target region of the reference image; identifying, based on a matching metric, one or more comparative regions of the reference image corresponding to the target region; acquiring a test image; masking the test image with the target region of the reference image and the one or more comparative regions of the reference image; defining a defect threshold for the target region in the test image based on the one or more comparative regions in the test image; and determining whether the target region of the test image contains a defect based on the defect threshold.
Abstract translation: 缺陷检测方法包括获取参考图像; 选择参考图像的目标区域; 基于匹配度量来识别对应于所述目标区域的所述参考图像的一个或多个比较区域; 获取测试图像; 用参考图像的目标区域和参考图像的一个或多个比较区域掩盖测试图像; 基于测试图像中的一个或多个比较区域，在测试图像中定义目标区域的缺陷阈值; 并根据缺陷阈值确定测试图像的目标区域是否包含缺陷。
-
公开(公告)号：WO2018132321A1
公开(公告)日：2018-07-19
申请号：PCT/US2018/012684
申请日：2018-01-05
Applicant: KLA-TENCOR CORPORATION
Inventor： PLIHAL, Martin , SOLTANMOHAMMADI, Erfan , PARAMASIVAM, Saravanan , RAVU, Sairam , JAIN, Ankit , UPPALURI, Prasanti , RAMACHANDRAN, Vijay
Abstract: Wafer inspection with stable nuisance rates and defect of interest capture rates are disclosed. This technique can be used for discovery of newly appearing defects that occur during the manufacturing process. Based on a first wafer, defects of interest are identified based on the classified filtered inspection results. For each remaining wafer, the defect classifier is updated and defects of interest in the next wafer are identified based on the classified filtered inspection results.
-
Search Results
2
records
(took 0.022 seconds)
