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公开(公告)号：JP2001109148A
公开(公告)日：2001-04-20
申请号：JP2000234922
申请日：2000-08-02
Applicant: KODAK POLYCHROME GRAPHICS GMBH
Inventor： JAREK MATHIAS , HAUCK GERHARD
IPC: G03F7/033 , B41N1/08 , B41N1/14 , C08F220/06 , C08F220/56 , C08F222/40 , C08K5/28 , C08L33/02 , C08L33/26 , C08L35/00 , C08L61/06 , G03F7/00 , G03F7/004 , G03F7/022 , G03F7/023
Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive composition which remarkably increases the chemical stabilities of a circuit board for an integrated circuit, a photomask and, particularly, a printing form. SOLUTION: The radiation sensitive composition contains (a) at least one novolak, (b) at least one naphthoquinonediazido derivative and (c) a copolymer comprising the units of formula A (where R1 and R4 are selected in such a way that a homopolymer of the formula A is made alkali-soluble), formula B (where R2, R6 and R7 are selected in such a way that a homopolymer of the formula B has a high glass transition temperature) and formula C (where R3 and R5 are selected in such a way that a homopolymer of the formula C is made water-soluble with the proviso that the unit of the formula C is different from the unit of the formula A).
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公开(公告)号：DE19936332A1
公开(公告)日：2001-03-15
申请号：DE19936332
申请日：1999-08-02
Applicant: KODAK POLYCHROME GRAPHICS GMBH
Inventor： JAREK MATHIAS , HAUCK GERHARD
Abstract: A radiation-sensitive composition comprises (a) a naphthoquinone diazide derivative(s); (b) a novolac(s); and (c) a copolymer comprising 3 specified units which are responsible for alkali-solubility, high Tg and water-solubility respectively. A radiation-sensitive composition comprises (a) a naphthoquinone diazide derivative(s); (b) a novolac(s); and (c) a copolymer comprising the following units: (A) 5-50 mol% unit of formula (I); (B) 20-70 mol% unit of formula (II); and (C) 10-50 mol% unit of formula (III), where (C) is different from (A). R , R = group selected so that the homopolymer of (I) is alkali-soluble; R , R , R = group selected so that the homopolymer of (II) has a high Tg; and R , R = group selected so that the homopolymer of (III) is water-soluble. Also claimed are (1) preparation of the above radiation-sensitive composition comprising mixing components (a)-(c) and dissolving the solids components in an organic solvent; (2) preparation of the above radiation-sensitive composition comprising dissolving the individual components (a)-(c) separately in an organic solvent and then mixing the solutions; (3) a printing plate comprising a substrate and the above radiation-sensitive composition; and (4) preparation of the printing plate comprising applying a solution of the above radiation-sensitive composition in an organic solvent to a substrate which has optionally been pre-treated, followed by drying.
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Patent Agency Ranking
公开(公告)号：DE60014536T2
公开(公告)日：2005-03-24
申请号：DE60014536
申请日：2000-08-01
Applicant: KODAK POLYCHROME GRAPHICS GMBH
Inventor： JAREK MATHIAS , HAUCK GERHARD
IPC: G03F7/033 , B41N1/08 , B41N1/14 , C08F220/06 , C08F220/56 , C08F222/40 , C08K5/28 , C08L33/02 , C08L33/26 , C08L35/00 , C08L61/06 , G03F7/00 , G03F7/004 , G03F7/022 , G03F7/023
Abstract: The invention describes radiation-sensitive compositions comprising at least one novolak, at least one naphthoquinone diazide derivative and a copolymer; the copolymer consisting of the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol% and R and R are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20 to 70 mol% and R , R and R are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10 to 50 mol% and R and R are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C. Furthermore, the invention describes printing plates produced therefrom.
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公开(公告)号：DE19936331A1
公开(公告)日：2001-02-15
申请号：DE19936331
申请日：1999-08-02
Applicant: KODAK POLYCHROME GRAPHICS GMBH
Inventor： JAREK MATHIAS
IPC: C08F222/40 , G03F7/023 , C08F220/18 , C08F216/36 , G03F7/12
Abstract: Copolymer comprises units A, B and C, where the A content is 5 - 50 mole% maximum, the B content is 20 - 70 mole% and the C content is 10 - 50 mole%. A copolymer comprises units A, B, and C, where the A content is 5-50 mole% maximum, A has the formula (I): R and R are selected so that the A homopolymer is alkali soluble, the B content is 20-70 mole%, B has the formula (II): R ,R , and R are selected so that B homopolymer has a high glass transition temperature, and the C content is 10-50 mole %, C has the formula (III): where R and R are selected so that the C homopolymer is water soluble and the weight content of C is different from that of A. An Independent claim is included for preparation of the copolymer involving: (a) preparation of a solution of monomers A, B, and C, where R-R are defined as for A, B, and C, in an organic solvent, (b) warming of the solution, and (c) addition of an initiator.
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公开(公告)号：DE19936333A1
公开(公告)日：2001-03-15
申请号：DE19936333
申请日：1999-08-02
Applicant: KODAK POLYCHROME GRAPHICS GMBH
Inventor： JAREK MATHIAS , HAUCK GERHARD
Abstract: A radiation-sensitive composition comprises (a) a naphthoquinone diazide derivative(s); (b) a novolac(s); and (c) a copolymer comprising 3 specified units which are responsible for alkali-solubility, high Tg and water-solubility respectively. A radiation-sensitive composition comprises (a) a naphthoquinone diazide derivative(s); (b) a novolac(s); and (c) a copolymer comprising the following units: (A) 5-50 mol% unit of formula (I); (B) 20-70 mol% unit of formula (II); and (C) 10-50 mol% unit of formula (III), where (C) is different from (A). R , R = group selected so that the homopolymer of (I) is alkali-soluble; R , R , R = group selected so that the homopolymer of (II) has a high Tg; and R , R = group selected so that the homopolymer of (III) is water-soluble. Also claimed are (1) preparation of the above radiation-sensitive composition comprising mixing components (a)-(c) and dissolving the solids components in an organic solvent; (2) preparation of the above radiation-sensitive composition comprising dissolving the individual components (a)-(c) separately in an organic solvent and then mixing the solutions; (3) a printing plate comprising a substrate and the above radiation-sensitive composition; and (4) preparation of the printing plate comprising applying a solution of the above radiation-sensitive composition in an organic solvent to a substrate which has optionally been pre-treated, followed by drying.
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公开(公告)号：DE19936331B4
公开(公告)日：2006-12-07
申请号：DE19936331
申请日：1999-08-02
Applicant: KODAK POLYCHROME GRAPHICS GMBH
Inventor： JAREK MATHIAS
IPC: C08F222/40 , C08F216/36 , C08F220/18 , G03F7/023 , G03F7/12
Abstract: Copolymers useful in radiation-sensitive layers of printing plates have the units A, B and Cwherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20-70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10-50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C.
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公开(公告)号：DE60014536D1
公开(公告)日：2004-11-11
申请号：DE60014536
申请日：2000-08-01
Applicant: KODAK POLYCHROME GRAPHICS GMBH
Inventor： JAREK MATHIAS , HAUCK GERHARD
IPC: G03F7/033 , B41N1/08 , B41N1/14 , C08F220/06 , C08F220/56 , C08F222/40 , C08K5/28 , C08L33/02 , C08L33/26 , C08L35/00 , C08L61/06 , G03F7/00 , G03F7/004 , G03F7/022 , G03F7/023
Abstract: The invention describes radiation-sensitive compositions comprising at least one novolak, at least one naphthoquinone diazide derivative and a copolymer; the copolymer consisting of the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol% and R and R are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20 to 70 mol% and R , R and R are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10 to 50 mol% and R and R are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C. Furthermore, the invention describes printing plates produced therefrom.
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