公开(公告)号：JP2002333707A

公开(公告)日：2002-11-22

申请号：JP2001140038

申请日：2001-05-10

Applicant: KODAK POLYCHROME GRAPHICS JP

Inventor： YUNO MARU

IPC: G03F7/004 ,  B41C1/10 ,  B41M5/36 ,  G03F7/00

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive composition which can be subjected to direct writing with IR emitting solid and semiconductor lasers, etc., and has superior storage stability and burning stain resistance and to provide a photosensitive planographic printing plate and a method for producing a planographic printing plate. SOLUTION: The photosensitive composition contains an alkali-soluble resin, an IR absorbent and an antioxidant. This antioxidant is preferably a phosphorous ester compound and/or a mercaptoimidazole compound. Preferably a cyclic acid anhydride is further contained. The photosensitive planographic printing plate has a photosensitive layer comprising the photosensitive composition formed on a support. In the method for producing a planographic printing plate, the photosensitive layer of the photosensitive planographic printing plate is imagewise exposed with active light of >=700 nm wavelength and the exposed parts are dissolved in an alkaline developing solution and removed.