公开(公告)号：JPH10186168A

公开(公告)日：1998-07-14

申请号：JP22882997

申请日：1997-08-11

Applicant: KOREA ELECTRONICS TELECOMM

Inventor： BEKU ZON HIYOPU ,  RI BON

IPC: G02B6/293 ,  C30B25/02 ,  G02B5/18 ,  G02B6/122 ,  G02B6/124 ,  G02B6/34 ,  H01L21/203

Abstract: PROBLEM TO BE SOLVED: To make it possible to simplify production stages by forming an optical waveguide layer having a surface of continuous comb-shaped patterns having the function of diffraction gratings by an epitaxy method on a substrate. SOLUTION: The optical waveguide layer 12 having the surface of the comb- shaped patterns is formed by epitaxy of an epitaxial layer on a substrate 11. A material having the refractive index larger than the refractive index of the substrate 11 is selected for the optical waveguide layer 12. If the substrate 11 is formed of GaAs, the optical waveguide layer 12 is formed of InGaAs. The process for production to form the surface of the InGaAs epitaxial layer (optical waveguide layer 12) as the comb-shaped patterns is important. The epitaxy method is applied as a method for manufacturing the diffraction grating coupler required in the field of light transmission. The easy impartation of the function as a waveguide simultaneously with the growth of the optical waveguide layer 12 is made possible by omitting all the stages for forming the conventional diffraction gratings.