Abstract:
METHOD OF FORMING OXIDE-BASED NANO-STRUCTURED MATERIAL Provided is a method of forming an oxide-based nano-structured material including growing a nano- structured material using a nano-nucleus having the same composition as the desired oxide-based nano- structured material. A solution is coated on a substrate, the solution including: an organic precursor containing M which is a transition metal or a semi metal; and an organic solvent in which the organic precursor is dissolved. A nano-nucleus having a composition of MxOy is formed on the substrate by annealing the substrate. A nano-structured material having a composition of MxOy is formed by growing the nano-nucleus while supplying a reaction precursor containing M into the nano-nucleus, and the nano- structured material is annealed.
Abstract:
A method of forming an oxide-based nano-structured material by growing a nano-structured material using a nano-nucleus having the same composition as the desired oxide-based nano-structured material. A solution is coated on a substrate by dipping, spin or spray coating. The solution includes an organic precursor containing a transition metal or a semi metal and an organic solvent in which the organic precursor is dissolved. A metal oxide nano-nucleus is then formed on the substrate by annealing the substrate. A metal oxide nano-structured material is formed by growing the nano-nucleus while supplying a reaction precursor containing the same metal as the formed oxide into the nano-nucleus. Methods used for this step include PVD, CVD and sol gel processes. The nano-structured material is finally annealed. The structure can be used in an electronic device such as a diode, a display, FET, SET or a battery.