公开(公告)号：US20220154339A1

公开(公告)日：2022-05-19

申请号：US16952530

申请日：2020-11-19

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： In Soo KIM ,  Chun Keun KIM ,  KWAN IL LEE ,  Gumin KANG ,  Joon Hyun KANG ,  Jin Gu KANG ,  Wonsuk LEE

IPC: C23C16/52 ,  C23C16/455 ,  G01N21/65 ,  C23C16/44 ,  G01J3/44 ,  G01J3/02

Abstract: A thin film deposition apparatus mounted with a Raman analysis system is discussed. The thin film deposition apparatus includes a reaction chamber providing an inner space for forming a thin film. An opening is formed on the thin film deposition apparatus to be connected to the reaction chamber, and the opening is closed by a window through which light can be transmitted.