公开(公告)号：US09844125B2

公开(公告)日：2017-12-12

申请号：US14979729

申请日：2015-12-28

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Young Min Jhon ,  Yong Soo Kim ,  Joon Mo Ahn ,  Min Ah Seo ,  Jae Hun Kim ,  Min Chul Park ,  Young Tae Byun ,  Chul Ki Kim ,  Seok Lee ,  Deok Ha Woo

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/008

Abstract: Provided is an extreme ultra-violet (EUV) beam generation apparatus using multi-gas cell modules in which a gas is prevented from directly flowing into a vacuum chamber by adding an auxiliary gas cell serving as a buffer chamber to a main gas cell, a diffusion rate of the gas is decreased, a high vacuum state is maintained, and a higher power EUV beam is continuously generated.

公开(公告)号：US09188484B2

公开(公告)日：2015-11-17

申请号：US14225698

申请日：2014-03-26

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Young Min Jhon ,  Yong Soo Kim ,  Min Ah Seo ,  Jae Hun Kim ,  Min Chul Park ,  Sun Ho Kim ,  Deok Ha Woo ,  Seok Lee ,  Taik Jin Lee ,  Myung Suk Chun ,  Woon Jo Cho

IPC: G01J3/02

CPC classification number: G01J3/0297 ,  G01J3/28 ,  G03F7/70516 ,  G03F7/70575 ,  G03F7/70616

Abstract: Provided are an apparatus and method for calibrating an extreme ultraviolet (EUV) spectrometer in which a wavelength of a spectrum of EUV light used for EUV lithography and mask inspection technology can be measured accurately.

Abstract translation: 提供了一种用于校准极紫外（EUV）光谱仪的装置和方法，其中可以精确地测量用于EUV光刻和掩模检查技术的EUV光的光谱的波长。

公开(公告)号：US09188485B1

公开(公告)日：2015-11-17

申请号：US14490948

申请日：2014-09-19

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Sun Ho Kim ,  Yong Soo Kim ,  Jae Hun Kim ,  Min-Chul Park ,  Young Tae Byun ,  Min Ah Seo ,  Joon Mo Ahn ,  Deok Ha Woo ,  Seok Lee ,  Taik Jin Lee ,  Young Min Jhon

IPC: G01D18/00 ,  G01J3/02 ,  G01J3/10 ,  G01J3/28

CPC classification number: G01J3/0297 ,  G01J3/10 ,  G01J3/28 ,  G01J3/2803 ,  G01J2003/282

Abstract: Disclosed are herein an apparatus and method for extreme ultraviolet (EUV) spectroscope calibration. The apparatus for EUV spectroscope calibration includes an EUV generating module, an Al filter, a diffraction grating, a CCD camera, a spectrum conversion module, and a control module that compares a wavelength value corresponding to a maximum peak among peaks of the spectrum depending on the order of the EUV light converted from the spectrum conversion module with a predetermined reference wavelength value depending on an order of high-order harmonics to calculate a difference value with the closest reference wavelength value, and controls the spectrum depending on the order of the EUV light converted from the spectrum conversion module to be moved in a direction of wavelength axis by the calculated difference value. Thus, it is possible to accurately measure a wavelength of a spectrum of EUV light used in EUV exposure technology and mask inspection technology.

Abstract translation: 本文公开了用于极紫外（EUV）分光仪校准的装置和方法。 用于EUV分光仪校准的装置包括EUV生成模块，Al滤光片，衍射光栅，CCD照相机，光谱转换模块和控制模块，该模块将与频谱峰值中的最大峰值对应的波长值与 根据高次谐波的顺序，从频谱转换模块转换成具有预定参考波长值的EUV光的顺序，以计算具有最接近参考波长值的差值，并根据EUV的顺序来控制光谱 从光谱转换模块转换为沿波长轴方向移动计算出的差值的光。 因此，可以精确地测量在EUV曝光技术和掩模检查技术中使用的EUV光的光谱的波长。