Abstract:
Provided are a thickness measuring apparatus and a thickness measuring method. The thickness measuring method includes irradiating first laser beam of a first wavelength λ1 to a transparent substrate and measuring intensity of first laser beam transmitting the transparent substrate; irradiating second laser beam of a second wavelength λ2 to the transparent substrate and measuring intensity of second laser beam transmitting the transparent substrate; and extracting a rotation angle on a Lissajous graph using the first and second laser beams transmitting the transparent substrate. A phase difference between adjacent rays by multiple internal reflection of the first laser beam and a phase difference between adjacent ray by multiple internal reflection of the second laser beam is maintained at π/2.
Abstract:
Provided are a transparent substrate monitoring apparatus and a transparent substrate monitoring method. The transparent substrate monitoring apparatus includes a light emitting unit emitting light; a double slit disposed on a plane defined in a first direction and a second direction intersecting a propagation direction of incident light and includes a first slit and a second slit spaced apart from each other in the first direction to allow the light to pass therethrough; an optical detection unit measuring an intensity profile or position of an interference pattern formed on a screen plane; and a signal processing unit receiving a signal from the optical detection unit to calculate an optical phase difference or an optical path difference.