OBJECTIVE LENS AND CHARGED PARTICLE BEAM APPARATUS INCLUDING SAME

    公开(公告)号:US20250046562A1

    公开(公告)日:2025-02-06

    申请号:US18519865

    申请日:2023-11-27

    Abstract: An objective lens for a charged particle beam apparatus that provides a charged particle beam to a sample, includes: a first electrode exposed to face a sample; a second electrode configured to focus a charged particle beam to the sample; a third electrode comprising a conical tip and a body extending from the tip; and a fourth electrode located in the body of the third electrode. Each of the first electrode, the second electrode, the third electrode, and the fourth electrode has a through-hole, and the charged particle beam is provided to the sample through the through-hole in response to a voltage applied.

    CHARGED PARTICLE BEAM APPARATUS
    2.
    发明申请

    公开(公告)号:US20250046564A1

    公开(公告)日:2025-02-06

    申请号:US18519810

    申请日:2023-11-27

    Abstract: A charged particle beam apparatus includes: a stage on which a sample is placed; a first charged particle beam unit comprising a charged particle source, a detector, and a first objective lens configured to irradiate a sample with a charged particle beam of charged particles generated by the charged particle source and induce secondary electrons generated from the sample to the detector; and a second charged particle beam unit comprising a second objective lens. An incoming electric field is generated between the first objective lens and the sample to pull the secondary electrons into the first objective lens. An induced electric field is generated between the second objective lens and the sample to guide the secondary electrons to travel to the detector.

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