公开(公告)号：WO2020106335A1

公开(公告)日：2020-05-28

申请号：PCT/US2019/045039

申请日：2019-08-05

Applicant: KLA-TENCOR CORPORATION

Inventor： MANASSEN, Amnon ,  PASKOVER, Yuri ,  AMIT, Eran

IPC: G01B11/27 ,  G01B9/02 ,  G01N21/47 ,  G03F7/20 ,  G01N21/956

Abstract: Scatterometry overlay (SCOL) measurement methods, systems and targets are provided to enable efficient SCOL metrology with in-die targets. Methods comprise generating a signal matrix by: illuminating a SCOL target at multiple values of at least one illumination parameter, and at multiple spot locations on the target, wherein the illumination is at a NA (numerical aperture) >1/3 yielding a spot diameter

公开(公告)号：WO2018187108A1

公开(公告)日：2018-10-11

申请号：PCT/US2018/024702

申请日：2018-03-28

Applicant: KLA-TENCOR CORPORATION

Inventor： MANASSEN, Amnon ,  NEGRI, Daria ,  HILL, Andrew V. ,  BACHAR, Ohad ,  LEVINSKI, Vladimir ,  PASKOVER, Yuri

IPC: H01L21/66

Abstract: A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.

公开(公告)号：WO2018128984A1

公开(公告)日：2018-07-12

申请号：PCT/US2018/012070

申请日：2018-01-02

Applicant: KLA-TENCOR CORPORATION

Inventor： LUBASHEVSKY, Yuval ,  PASKOVER, Yuri ,  LEVINSKI, Vladimir ,  MANASSEN, Amnon

IPC: G01N21/47 ,  G01N21/88

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and - first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and - diffraction patterns. The + and - diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：WO2017044283A1

公开(公告)日：2017-03-16

申请号：PCT/US2016/047619

申请日：2016-08-18

Applicant: KLA-TENCOR CORPORATION

Inventor： LEVINSKI, Vladimir ,  PASKOVER, Yuri ,  LUBASHEVSKY, Yuval ,  MANASSEN, Amnon

IPC: G01N21/47 ,  G01J3/44

CPC classification number: G01B11/272 ,  G01B9/0201 ,  G01N21/4788 ,  G03F7/70633

Abstract: Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions.

Abstract translation: 提供了测量方法和工具，其通过固定照明源照射固定衍射靶，测量由零级衍射信号和一级衍射信号的和组成的信号，重复测量多个关系 同时保持衍射目标和照明源平稳，并从测量的和导出一阶衍射信号。 照明可以是相干的，并且测量可以在光瞳平面中，或者照明可能不相干，并且测量可能在场平面中，在任一情况下，测量第零和第一衍射级的部分重叠。 照明可以是环形的，并且衍射靶可以是具有不同间距的周期性结构以分离重叠区域的单细胞SCOL靶。

公开(公告)号：WO2016187468A1

公开(公告)日：2016-11-24

申请号：PCT/US2016/033353

申请日：2016-05-19

Applicant: KLA-TENCOR CORPORATION

Inventor： LEVINSKI, Vladimir ,  PASKOVER, Yuri ,  MANASSEN, Amnon ,  SHALIBO, Yoni

IPC: G01N21/88 ,  G01N21/65

CPC classification number: G03F7/70633 ,  G02B7/38 ,  G02B27/32 ,  G06T7/80 ,  H04N5/23212

Abstract: Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

Abstract translation: 提供了测量工具和方法，其估计了由于光散射对周期性目标产生的不同衍射级的地形相位的影响，并且调整测量条件以提高测量精度。 在成像中，通过使用偏振目标和/或光学系统，使用多个散焦位置等来选择适当的测量条件，可以通过选择适当的测量条件来减少对比度功能行为，改变照明条件（降低光谱宽度和照度NA） 测量结果的飞行校准可以在使用附加测量或附加目标单元的成像或散射测量中进行。

公开(公告)号：WO2019199585A1

公开(公告)日：2019-10-17

申请号：PCT/US2019/025917

申请日：2019-04-05

Applicant: KLA-TENCOR CORPORATION

Inventor： HILL, Andrew V. ,  BACHAR, Ohad ,  ABRAMOV, Avi ,  PASKOVER, Yuri ,  PERRY, Dor

IPC: G06T7/33 ,  G06T7/73 ,  G06T5/50 ,  G01B11/00

Abstract: An overlay metrology tool providing site-by-site alignment includes a controller coupled to a telecentric imaging system. The controller may receive two or more alignment images of an overlay target on a sample captured at two or more focal positions by the imaging system, generate alignment data indicative of an alignment of the overlay target within the imaging system based on the alignment images, set the alignment images as measurement images when the alignment of the overlay target is within selected alignment tolerances, direct the imaging system to adjust the alignment of the overlay target in the imaging system and further receive one or more measurement images from the imaging system when the alignment of the overlay target is outside the selected alignment tolerances, and determine overlay between two or more layers of the sample based on at least one of the measurement images.

公开(公告)号：WO2019135819A1

公开(公告)日：2019-07-11

申请号：PCT/US2018/057896

申请日：2018-10-29

Applicant: KLA-TENCOR CORPORATION

Inventor： LUBASHEVSKY, Yuval ,  PASKOVER, Yuri ,  LEVINSKI, Vladimir ,  MANASSEN, Amnon

IPC: G03F7/20 ,  H01L21/66

CPC classification number: G03F7/70633 ,  G01N21/4788 ,  G01N21/9501 ,  G02B27/4255 ,  G03F7/70625

Abstract: A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and - first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and - diffraction patterns. The + and - diffraction patterns may be compared to calculate the overlay between successive layers.

公开(公告)号：WO2018063471A3

公开(公告)日：2018-04-05

申请号：PCT/US2017/041404

申请日：2017-07-10

Applicant: KLA-TENCOR CORPORATION

Inventor： PASKOVER, Yuri ,  MANASSEN, Amnon ,  LEVINSKI, Vladimir

IPC: G01B11/02 ,  G01B9/02

Abstract: Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements. The optical microcavity probes detect features on a wafer by shifts in an interference signal between reference radiation and near-field interactions of radiation in the microcavities and wafer features, such as device features and metrology target features. Various illumination and detection configurations provide quick and sensitive signals which are used to enhance optical metrology measurements with respect to their accuracy and sensitivity. The optical microcavity probes may be scanned at a controlled height and position with respect to the wafer and provide information concerning the spatial relations between device and target features.

公开(公告)号：WO2018023078A1

公开(公告)日：2018-02-01

申请号：PCT/US2017/044528

申请日：2017-07-28

Applicant: KLA-TENCOR CORPORATION

Inventor： HILL, Andy (Andrew) ,  MANASSEN, Amnon ,  PASKOVER, Yuri ,  LUBASHEVSKY, Yuval

IPC: G01N21/47 ,  G01N21/95 ,  G01B11/00 ,  G02B27/28 ,  G02B27/42

Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.

Abstract translation: 提供了计量方法和系统，其中检测到的图像在计量系统的光学系统的收集路径的场平面处被分成至少两个光瞳平面图像。 诸如棱镜之类的光学元件可用于分割场平面图像，并且可通过空间分割场平面和/或照明源和/或通过使用两种偏振类型来同时测量多个目标或目标单元。 同时捕获多个靶标或靶细胞增加了所公开的计量系统的通量。

公开(公告)号：WO2016069520A1

公开(公告)日：2016-05-06

申请号：PCT/US2015/057449

申请日：2015-10-27

Applicant: KLA-TENCOR CORPORATION

Inventor： EFRATY, Boris ,  PASKOVER, Yuri

IPC: G03F9/00

CPC classification number: G01B11/00 ,  G03F7/70633

Abstract: Methods are provided, which estimate a quality of a metrology target by calculating a noise metric of its ROI kernels, derived from application of a Fourier filter on the measured kernel with respect to a periodicity of the target's periodic structure(s); and using the calculated noise metric to indicate the target quality. An additional Fourier filter may be applied perpendicularly on the measured kernel with respect to a periodicity of a perpendicular segmentation of the periodic structure(s), and the (2D) noise metric may be derived by application of both Fourier filters. The estimated noise may be analyzed statistically to provide various types of information on the target.

Abstract translation: 提供了一种方法，其通过计算其ROI核心的噪声度量来估计度量目标的质量，所述噪声度量是相对于所述目标周期性结构的周期性而在测量的内核上应用傅里叶滤波器得到的; 并使用计算出的噪声指标来指示目标质量。 可以相对于周期性结构的垂直分割的周期性将附加的傅立叶滤波器垂直地施加在测量的内核上，并且可以通过应用两个傅立叶滤波器来导出（2D）噪声度量。 可以对估计的噪声进行统计分析，以提供目标上的各种类型的信息。