公开(公告)号：US20020160299A1

公开(公告)日：2002-10-31

申请号：US10034982

申请日：2001-12-28

Applicant: Kodak Polychrome Graphics, L.L.C.

Inventor： Yasuhiro Asawa ,  Yasuhiro Ishizuka ,  Eiji Hayakawa ,  S. Peter Pappas

IPC: C08G085/00 ,  C07D239/46

CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/262 ,  B41C2210/264 ,  B41C2210/266 ,  C08G18/285 ,  C08G18/3848 ,  C08G18/542 ,  C08G73/0273 ,  C08G73/0694 ,  C08G83/008 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/109 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165 ,  C09D163/00 ,  C08L101/00

Abstract: The present invention includes a two-layer imageable element, including: a substrate, a top layer including a first thermally imageable composition including (a) a first thermally sensitive supramolecular polymer or (b) a thermally imageable composition free of the first thermally sensitive supramolecular polymer; and disposed between the substrate and the top layer, a bottom layer including a second thermally imageable composition, which includes a second thermally sensitive supramolecular polymer. The present invention also includes a method of producing the imaged element.

Abstract translation: 本发明包括两层可成像元件，其包括：基材，顶层，其包含第一可热成像组合物，其包含（a）第一热敏超分子聚合物或（b）不含第一热敏超分子的热可成像组合物 聚合物; 并且设置在所述基底和所述顶层之间，底层包括第二可热成像组合物，其包含第二热敏超分子聚合物。 本发明还包括一种制造成像元件的方法。