公开(公告)号：EP4492077A3

公开(公告)日：2025-04-30

申请号：EP24187555.8

申请日：2024-07-09

Applicant: Korea Research Institute of Standards and Science

Inventor： HWANG, Chan Yong ,  MOON, Kyoung Woong ,  KIM, Chang Soo ,  LEE, Sang Sun ,  YANG, Seung Mo

IPC: G01R33/032 ,  G01R33/12 ,  G01N21/95 ,  G03F7/00 ,  G01R33/10

Abstract: Proposed are a wafer inspection apparatus and a method of inspecting a wafer using the wafer inspection apparatus. The proposed wafer inspection apparatus includes a horizontal magnetic field generation unit arranged proximate to a lateral surface of a wafer and forming a magnetic field in such a manner that lines of magnetic force propagate in a horizontal direction, a vertical magnetic field generation unit arranged under the wafer and generating a magnetic field in such a manner that lines of magnetic force propagate in a direction vertical to the wafer, an image measurement unit arranged over the wafer and measuring an image of the wafer, and a wafer movement stage moving the wafer in a first direction and a second direction.

公开(公告)号：EP4492077A2

公开(公告)日：2025-01-15

申请号：EP24187555.8

申请日：2024-07-09

Applicant: Korea Research Institute of Standards and Science

Inventor： HWANG, Chan Yong ,  MOON, Kyoung Woong ,  KIM, Chang Soo ,  LEE, Sang Sun ,  YANG, Seung Mo

IPC: G01R33/032 ,  G01R33/12 ,  G01N21/95 ,  G03F7/00 ,  G01R33/10

Abstract: Proposed are a wafer inspection apparatus and a method of inspecting a wafer using the wafer inspection apparatus. The proposed wafer inspection apparatus includes a horizontal magnetic field generation unit arranged proximate to a lateral surface of a wafer and forming a magnetic field in such a manner that lines of magnetic force propagate in a horizontal direction, a vertical magnetic field generation unit arranged under the wafer and generating a magnetic field in such a manner that lines of magnetic force propagate in a direction vertical to the wafer, an image measurement unit arranged over the wafer and measuring an image of the wafer, and a wafer movement stage moving the wafer in a first direction and a second direction.