公开(公告)号：US20250020445A1

公开(公告)日：2025-01-16

申请号：US18771012

申请日：2024-07-12

Applicant: Korea Research Institute of Standards and Science

Inventor： Chan Yong HWANG ,  Kyoung Woong MOON ,  Chang Soo KIM ,  Sang Sun LEE ,  Seung Mo YANG

IPC: G01B7/34 ,  G01B11/30

Abstract: Proposed are a wafer inspection apparatus and a method of inspecting a wafer using the wafer inspection apparatus. The proposed wafer inspection apparatus includes a horizontal magnetic field generation unit arranged proximate to a lateral surface of a wafer and forming a magnetic field in such a manner that lines of magnetic force propagate in a horizontal direction, a vertical magnetic field generation unit arranged under the wafer and generating a magnetic field in such a manner that lines of magnetic force propagate in a direction vertical to the wafer, an image measurement unit arranged over the wafer and measuring an image of the wafer, and a wafer movement stage moving the wafer in a first direction and a second direction.