公开(公告)号：SG10201404158RA

公开(公告)日：2015-02-27

申请号：SG10201404158R

申请日：2014-07-17

Applicant: LAM RES CORP

Inventor： SRIRAMAN SARAVANAPRIYAN ,  DREWERY JOHN ,  MCCHESNEY JOHN ,  PATERSON ALEX

Abstract: A chamber is provided. The chamber includes a Faraday shield positioned above a substrate support of the chamber. A dielectric window is disposed over the Faraday shield, and the dielectric window has a center opening. A hub having an internal plenum for passing a flow of fluid received from an input conduit and removing the flow of fluid from an output conduit is further provided. The hub has sidewalls and a center cavity inside of the sidewalls for an optical probe, and the internal plenum is disposed in the sidewalls. The hub has an interface surface that is in physical contact with a back side of the Faraday shield. The physical contact provides for a thermal couple to the Faraday shield at a center region around said center opening, and an outer surface of the sidewalls of the hub are disposed within the center opening of the dielectric window.

公开(公告)号：SG10201603087TA

公开(公告)日：2016-05-30

申请号：SG10201603087T

申请日：2012-04-24

Applicant: LAM RES CORP

Inventor： DREWERY JOHN ,  LONG MAOLIN ,  PATERSON ALEX

Abstract: Plasma processing chambers having internal Faraday shields with defined groove configurations, are defined. In one example, the chamber includes an electrostatic chuck for receiving a substrate and a dielectric window connected to a top portion of the chamber, where the dielectric window disposed over the electrostatic chuck. Also included is a Faraday shield disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range, a middle zone having a middle radius range, an outer zone having an outer radius range, where the inner zone is adjacent to the middle zone, and the middle zone being adjacent to the outer zone. Further defining the Faraday shield is a first set of radial slots (A) extending through the inner zone, the middle zone, and the outer zone, a second set of radial slots (C) extending through only the outer zone; and a third set of radial slots (B) extending through the middle zone and outer zone. In this configuration, the first, second and third radial slots are arranged radially around the Faraday shield in a repeating pattern of slots A, C, B, and C.

公开(公告)号：SG194224A1

公开(公告)日：2013-11-29

申请号：SG2013078704

申请日：2012-04-24

Applicant: LAM RES CORP

Inventor： DREWERY JOHN ,  LONG MAOLIN ,  PATERSON ALEX

Abstract: Plasma processing chambers having internal Faraday shields with defined groove configurations, are defined. In one example, the chamber includes an electrostatic chuck for receiving a substrate and a dielectric window disposed over the electrostatic chuck. Also included is a Faraday shield inside of the chamber and between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone, a middle zone adjacent to the inner zone, and an outer zone adjacent to the middle zone. Further defining the Faraday shield is a first set of radial slots (A) extending through all three zones, a second set of radial slots (C) extending through only the outer zone; and a third set of radial slots (B) extending through the middle and outer zones. The first, second and third radial slots are arranged radially around the Faraday shield in a pattern of slots A, C, B, and C.