公开(公告)号：SG133600A1

公开(公告)日：2007-07-30

申请号：SG2007045271

申请日：2004-08-20

Applicant: LAM RES CORP US

Inventor： DHINDSA RAJINDER ,  SADJADI REZA S M ,  KOZAKEVICH FELIX ,  TRUSSELL DAVE ,  LI LUMIN ,  LENZ ERIC ,  RUSU CAMELIA ,  SRINIVASAN MUKUND ,  EPPLER AARON ,  TIETZ JIM ,  MARKS JEFFREY

IPC: H01J37/32

Abstract: A method of processing a workpiece (18) with a plasma in a vacuum plasma processing chamber (10) having a bottom electrode (13) below the workpiece, comprising the step of exciting a plasma with electric energy at several frequencies, i.e. three or more, such that the excitation of the plasma by applying energy at the several frequencies simultaneously causes several different phenomena to occur in the plasma, wherein the phenomena affct plasma ion energy, plasma ion densityand plasma chemistry. An apparatus for carrying out this method comprises an electric energy source arrangement (51) for supplying the several frequencies (F1, F2, F3) to the bottom electrode.