Abstract:
A solar cell and a method for manufacturing the same are discussed. The method for manufacturing the solar cell includes forming an amorphous silicon layer on a back surface of a crystalline semiconductor substrate containing impurities of a first conductive type, performing a first diffusion process for diffusing impurities of a second conductive type opposite the first conductive type into a portion of the amorphous silicon layer to form an emitter region, and performing a second diffusion process for diffusing impurities of the first conductive type into a remaining portion except the portion of the amorphous silicon layer having the impurities of the second conductive type to form a back surface field region. When at least one of the first diffusion process and the second diffusion process is performed, the amorphous silicon layer is crystallized to form a silicon layer.
Abstract:
Disclosed is a solar cell (100) including: a semiconductor substrate (10); a tunneling layer (52) on a surface of the semiconductor substrate; an intermediate layer (52a) on the tunneling layer, wherein the intermediate layer including a hydroxyl group (an OH group); a first conductive region (20) on the intermediate layer, wherein the first conductive region comprising a metal oxide layer for extracting a first carrier; and a first electrode (42) electrically connected to the first conductive region.
Abstract:
A solar cell is discussed. The solar cell according to an embodiment includes a semiconductor substrate containing impurities of a first conductive type, a metal oxide layer positioned on the semiconductor substrate, an emitter region positioned on the metal oxide layer and having a second conductive type opposite the first conductive type, a first electrode connected to the emitter region, and a second electrode connected to the semiconductor substrate.
Abstract:
Disclosed is a method for manufacturing a solar cell. The method includes: forming a first tunneling layer on one surface of a semiconductor substrate; forming a first conductive region on the first tunneling layer so that the first conductive region includes a metal oxide layer having an amorphous structure; and forming a first electrode electrically connected to the first conductive region.
Abstract:
Disclosed is a solar cell including a semiconductor substrate, a protective-film layer formed over one surface of the semiconductor substrate, a first conductive area disposed over the protective-film layer, the first conductive area being of a first conductive type and including a crystalline semiconductor, and a first electrode electrically connected to the first conductive area. The first conductive area includes a first portion disposed over the protective-film layer and having a first crystal grain size, and a second portion disposed over the first portion and having a second crystal grain size, which is greater than the first crystal grain size.