Method of fabricating array substrate having color filter on thin film transistor structure
    1.
    发明申请
    Method of fabricating array substrate having color filter on thin film transistor structure 有权
    在薄膜晶体管结构上制造具有滤色片的阵列基板的方法

    公开(公告)号:US20040266041A1

    公开(公告)日:2004-12-30

    申请号:US10880274

    申请日:2004-06-29

    Inventor: Dong-Guk Kim

    Abstract: In a liquid crystal display device substrate, an insulating layer covers a thin film transistor. Another insulating layer covers a black matrix, which is formed on the insulating layer and covers the thin film transistor, a gate line, and a data line except a portion of a drain electrode. A first transparent conductive layer covers the top insulating layer and contacts the exposed portions of the drain electrode, a gate pad and a data pad. A buffer layer is formed on the first conductive layer and a color filter is formed on the buffer layer. The buffer layer is exposed by the color filter to reveal portions of the first conductive layer. A second transparent conductive layer covers the color filter and the revealed portions of the first conductive layer. The conductive layers are patterned to form pixel electrodes and double-layered gate and data pad terminals.

    Abstract translation: 在液晶显示装置基板中,绝缘层覆盖薄膜晶体管。 另一绝缘层覆盖黑矩阵,该黑矩阵形成在绝缘层上并覆盖薄膜晶体管,栅极线和除了漏电极的一部分之外的数据线。 第一透明导电层覆盖顶部绝缘层并接触漏电极的暴露部分,栅极焊盘和数据焊盘。 在第一导电层上形成缓冲层,在缓冲层上形成滤色器。 缓冲层由滤色器曝光以露出第一导电层的部分。 第二透明导电层覆盖滤色器和第一导电层的露出部分。 将导电层图案化以形成像素电极和双层栅极和数据焊盘端子。

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