Liquid crystal display panel and method for fabricating the same

    公开(公告)号:US20040165120A1

    公开(公告)日:2004-08-26

    申请号:US10786109

    申请日:2004-02-26

    CPC classification number: G02F1/13458 G02F1/1339 G02F1/1345

    Abstract: The present invention discloses an LCD panel and a method for fabricating the same. More specifically, the LCD panel includes first and second substrates, a photo-hardening sealant between the first and second substrates, a plurality of metal lines on the first substrate, wherein the metal lines are formed of a transparent conductive film at least at portions where the metal lines cross one another, and a liquid crystal layer between the first and second substrates. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

    Liquid crystal display device and method of fabricating the same
    2.
    发明申请
    Liquid crystal display device and method of fabricating the same 有权
    液晶显示装置及其制造方法

    公开(公告)号:US20040085500A1

    公开(公告)日:2004-05-06

    申请号:US10673145

    申请日:2003-09-30

    CPC classification number: G02F1/1362 G02F1/13363 G02F2001/133565

    Abstract: A liquid crystal display device includes a transparent insulating substrate, a gate line and a gate electrode on the transparent insulating substrate, a gate insulating film, an active layer, an ohmic contact layer, source and drain electrodes, and a data line on the transparent insulating substrate, a passivation film formed on the transparent insulating substrate including the source and drain electrodes and the data line, a compensation film formed on the passivation film, and a pixel electrode formed on at least the compensation film.

    Abstract translation: 液晶显示装置包括在透明绝缘基板上的透明绝缘基板,栅极线和栅电极,栅极绝缘膜,有源层,欧姆接触层,源极和漏极以及透明的数据线 绝缘基板,形成在包括源极和漏极和数据线的透明绝缘基板上的钝化膜,形成在钝化膜上的补偿膜,以及形成在至少补偿膜上的像素电极。

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