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1.发明申请STACKED TWO-DIMENSIONAL MATERIALS AND METHODS FOR PRODUCING STRUCTURES INCORPORATING SAME 审中-公开堆叠的二维材料和生产结合物的方法
公开(公告)号：WO2015172050A3
公开(公告)日：2016-02-04
申请号：PCT/US2015029932
申请日：2015-05-08
Applicant: LOCKHEED CORP
Inventor： FLEMING SHAWN P , BEDWORTH PETER V , CASEY DAVID F JR , HEISE SCOTT E , KAPELANCZYK MATTHEW M , SINTON STEVEN W , STOLTENBERG RANDALL M , SWETT JACOB L , TUROWSKI DAVID B , LIU HAN
CPC classification number: B01D69/12 , B01D61/002 , B01D61/02 , B01D61/025 , B01D61/027 , B01D61/14 , B01D61/145 , B01D61/147 , B01D61/36 , B01D63/081 , B01D63/082 , B01D65/003 , B01D67/0034 , B01D69/02 , B01D69/10 , B01D71/021 , B01D71/40 , B01D2325/02 , B01D2325/04 , B32B37/0084 , B32B37/18 , Y10T156/10
Abstract: Structures comprising a first sheet of perforated two-dimensional material and a first plurality of spacer elements disposed between a surface of the first sheet of perforated two-dimensional material and at least one of a surface of a structural substrate and a surface of a second sheet of perforated two-dimensional material are disclosed, as well as related methods. The structures may further comprise a structural substrate, a second plurality of spacer elements, additional sheets of perforated two-dimensional material in direct contact with the first and/or said second sheet of perforated two-dimensional material and/or relief features in the surface of the structural substrate.
Abstract translation: 包括第一片穿孔二维材料和设置在第一穿孔二维材料片的表面之间的第一多个间隔元件和结构基底的表面和第二片表面中的至少一个的结构 公开了穿孔二维材料，以及相关方法。 结构还可以包括结构基底，第二多个间隔元件，与第一和/或第二片穿孔二维材料和/或表面中的浮雕特征直接接触的另外的穿孔二维材料片 的结构基材。
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2.发明申请PROCESSES FOR FORMING COMPOSITE STRUCTURES WITH A TWO-DIMENSIONAL MATERIAL USING A POROUS, NON-SACRIFICIAL SUPPORTING LAYER 审中-公开使用多孔非支撑层形成具有二维材料的复合结构的方法
公开(公告)号：WO2015116857A3
公开(公告)日：2015-11-05
申请号：PCT/US2015013599
申请日：2015-01-29
Applicant: LOCKHEED CORP
Inventor： SINSABAUGH STEVEN LLOYD , BEDWORTH PETER V , CASEY DAVID FRANCIS JR , HEISE SCOTT E , SINTON STEVEN W , STOLTENBERG RANDALL MARK , SWETT JACOB LOUIS
IPC: C03C27/00
CPC classification number: B01D67/0069 , B01D67/0004 , B01D67/002 , B01D67/003 , B01D67/0034 , B01D67/0037 , B01D67/0053 , B01D67/0058 , B01D67/0062 , B01D67/0072 , B01D69/02 , B01D69/10 , B01D71/021 , B01D2323/39 , B01D2325/24
Abstract: It can be difficult to remove atomically thin films, such as graphene, graphene-based material and other two-dimensional materials, from a growth substrate and then to transfer the thin films to a secondary substrate. Tearing and conformality issues can arise during the removal and transfer processes. Processes for forming a composite structure by manipulating a two-dimensional material, such as graphene or graphene-base material, can include: providing a two-dimensional material adhered to a growth substrate; depositing a supporting layer on the two-dimensional material while the two-dimensional material is adhered to the growth substrate; and releasing the two-dimensional material from the growth substrate, the two-dimensional material remaining in contact with the supporting layer following release of the two-dimensional material from the growth substrate.
Abstract translation: 从生长衬底去除原子薄膜，例如石墨烯，石墨烯材料和其它二维材料，然后将薄膜转移到二次衬底可能是困难的。 在拆除和转移过程中可能会出现撕裂和保形问题。 通过操作诸如石墨烯或石墨烯基材料的二维材料形成复合结构的方法可以包括：提供粘附到生长基底上的二维材料; 在二维材料粘附到生长衬底上时，在二维材料上沉积支撑层; 并且从生长衬底释放二维材料，二维材料在从生长衬底释放二维材料后保持与支撑层接触。
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3.发明公开PROCESSES FOR FORMING COMPOSITE STRUCTURES WITH A TWO-DIMENSIONAL MATERIAL USING A POROUS, NON-SACRIFICIAL SUPPORTING LAYER 审中-公开VERFAHREN ZUR FORMUNG VON VERBUNDSTRUKTUREN MIT EINEM ZWEIDIMENSIONALEN材料UNTER VERWENDUNG EINERPORÖSEN，NICHTBESCHÄDIGENDENTRÄGERSCHICHT
公开(公告)号：EP3099645A4
公开(公告)日：2017-09-27
申请号：EP15743750
申请日：2015-01-29
Applicant: LOCKHEED CORP
Inventor： SINSABAUGH STEVEN LLOYD , BEDWORTH PETER V , CASEY DAVID FRANCIS JR , HEISE SCOTT E , SINTON STEVEN W , STOLTENBERG RANDALL MARK , SWETT JACOB LOUIS
CPC classification number: B01D67/0069 , B01D67/0004 , B01D67/002 , B01D67/003 , B01D67/0034 , B01D67/0037 , B01D67/0053 , B01D67/0058 , B01D67/0062 , B01D67/0072 , B01D69/02 , B01D69/10 , B01D71/021 , B01D2323/39 , B01D2325/24
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4.发明公开
公开(公告)号：EP3140028A4
公开(公告)日：2018-01-03
申请号：EP15789852
申请日：2015-05-08
Applicant: LOCKHEED CORP
Inventor： FLEMING SHAWN P , BEDWORTH PETER V , CASEY DAVID F JR , HEISE SCOTT E , KAPELANCZYK MATTHEW M , SINTON STEVEN W , STOLTENBERG RANDALL M , SWETT JACOB L , TUROWSKI DAVID B , LIU HAN
CPC classification number: B01D69/12 , B01D61/002 , B01D61/02 , B01D61/025 , B01D61/027 , B01D61/14 , B01D61/145 , B01D61/147 , B01D61/36 , B01D63/081 , B01D63/082 , B01D65/003 , B01D67/0034 , B01D69/02 , B01D69/10 , B01D71/021 , B01D71/40 , B01D2325/02 , B01D2325/04 , B32B37/0084 , B32B37/18 , Y10T156/10
Abstract: Structures comprising a first sheet of perforated two-dimensional material and a first plurality of spacer elements disposed between a surface of the first sheet of perforated two-dimensional material and at least one of a surface of a structural substrate and a surface of a second sheet of perforated two-dimensional material are disclosed, as well as related methods. The structures may further comprise a structural substrate, a second plurality of spacer elements, additional sheets of perforated two-dimensional material in direct contact with the first and/or said second sheet of perforated two-dimensional material and/or relief features in the surface of the structural substrate.
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公开(公告)号：SG11201606287VA
公开(公告)日：2016-08-30
申请号：SG11201606287V
申请日：2015-01-29
Applicant: LOCKHEED CORP
Inventor： SINSABAUGH STEVEN LLOYD , BEDWORTH PETER V , CASEY DAVID FRANCIS JR , HEISE SCOTT E , SINTON STEVEN W , STOLTENBERG RANDALL MARK , SWETT JACOB LOUIS
IPC: C03C27/00
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Patent Agency Ranking
公开(公告)号：CA2938305A1
公开(公告)日：2015-08-06
申请号：CA2938305
申请日：2015-01-29
Applicant: LOCKHEED CORP
Inventor： SINSABAUGH STEVEN LLOYD , BEDWORTH PETER V , CASEY DAVID FRANCIS JR , HEISE SCOTT E , SINTON STEVEN W , STOLTENBERG RANDALL MARK , SWETT JACOB LOUIS
Abstract: It can be difficult to remove atomically thin films, such as graphene, graphene-based material and other two-dimensional materials, from a growth substrate and then to transfer the thin films to a secondary substrate. Tearing and conformality issues can arise during the removal and transfer processes. Processes for forming a composite structure by manipulating a two-dimensional material, such as graphene or graphene-base material, can include: providing a two-dimensional material adhered to a growth substrate; depositing a supporting layer on the two-dimensional material while the two-dimensional material is adhered to the growth substrate; and releasing the two-dimensional material from the growth substrate, the two-dimensional material remaining in contact with the supporting layer following release of the two-dimensional material from the growth substrate.
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公开(公告)号：CA2994549A1
公开(公告)日：2017-02-09
申请号：CA2994549
申请日：2016-04-14
Applicant: LOCKHEED CORP
Inventor： SWETT JACOB L , BEDWORTH PETER V , HEISE SCOTT E , SINTON STEVEN W , SIMON SARAH M
Abstract: Sheets of graphene-based material comprising single layer graphene and suitable for formation of a plurality of perforations in the single layer graphene are provided. In an aspect, the sheets of graphene-based material are formed by chemical vapor deposition followed by one or more conditioning steps. In a further aspect, the sheets of graphene-based material include non-graphenic carbon-based material and may be characterized the amount, mobility and/or volatility of the non-graphenic carbon-based material.
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公开(公告)号：CA2994378A1
公开(公告)日：2017-02-09
申请号：CA2994378
申请日：2016-04-14
Applicant: LOCKHEED CORP
Inventor： SWETT JACOB L , BEDWORTH PETER V , HEISE SCOTT E , SINTON STEVEN W , SIMON SARAH M
Abstract: Perforated sheets of graphene-based material having a plurality of perforations are provided. The perforated sheets may include perforated single layer graphene. The perforations may be located over greater than 10% of said area of said sheet of graphene-based material and the mean pore size of the perforations selected from the range of 0.3 nm to 1 µm. Methods for making the perforated sheets are also provided.
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9.发明专利
公开(公告)号：SG11201609272TA
公开(公告)日：2016-12-29
申请号：SG11201609272T
申请日：2015-05-08
Applicant: LOCKHEED CORP
Inventor： FLEMING SHAWN P , BEDWORTH PETER V , CASEY DAVID F JR , HEISE SCOTT E , KAPELANCZYK MATTHEW M , SINTON STEVEN W , STOLTENBERG RANDALL M , SWETT JACOB L , TUROWSKI DAVID B , LIU HAN
Abstract: Structures comprising a first sheet of perforated two-dimensional material and a first plurality of spacer elements disposed between a surface of the first sheet of perforated two-dimensional material and at least one of a surface of a structural substrate and a surface of a second sheet of perforated two-dimensional material are disclosed, as well as related methods. The structures may further comprise a structural substrate, a second plurality of spacer elements, additional sheets of perforated two-dimensional material in direct contact with the first and/or said second sheet of perforated two-dimensional material and/or relief features in the surface of the structural substrate.
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公开(公告)号：IL257288D0
公开(公告)日：2018-06-28
申请号：IL25728818
申请日：2018-02-01
Applicant: LOCKHEED CORP , SWETT JACOB L , BEDWORTH PETER V , HEISE SCOTT E , SINTON STEVEN W , SIMON SARAH M
Inventor： SWETT JACOB L , BEDWORTH PETER V , HEISE SCOTT E , SINTON STEVEN W , SIMON SARAH M
IPC: C23C20060101
Abstract: Perforated sheets of graphene-based material having a plurality of perforations are provided. The perforated sheets may include perforated single layer graphene. The perforations may be located over greater than 10% of said area of said sheet of graphene-based material and the mean pore size of the perforations selected from the range of 0.3 nm to 1 μm. Methods for making the perforated sheets are also provided.
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